Surface nano-structured silicon carbide thin film produced using hot filament decomposition of ethylene at low temperature on silicon wafer

Preparation and characterizations of amorphous nanostructured SiC thin films by low energy pulsed laser deposition

“…Additionally, amorphous SiC is used in the fabrication of microelectronic and optoelectronic devices [2]. Synthesis of different nanostructured SiC forms such as nanospheres, nanowires, and nanorods have been reported [1,8,9].…”

“…Chemical vapor deposition (CVD) and its modification techniques such as metal organic chemical vapor deposition (MOCVD), plasmaenhanced CVD (PECVD) and hot filament chemical vapor deposition (HFCVD) produce crystalline SiC thin film at high temperature or amorphous SiC at moderate temperature ($200 8C) that can be crystallized by annealing at higher temperature [2,8,9]. Electron beam-physical vapor deposition (EB-PVD) and direct ion deposition [10,11] are alternative techniques for SiC deposition.…”