2017
DOI: 10.1186/s11671-017-2115-8
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Surface Morphology Evolution Mechanisms of InGaN/GaN Multiple Quantum Wells with Mixture N2/H2-Grown GaN Barrier

Abstract: Surface morphology evolution mechanisms of InGaN/GaN multiple quantum wells (MQWs) during GaN barrier growth with different hydrogen (H2) percentages have been systematically studied. Ga surface-diffusion rate, stress relaxation, and H2 etching effect are found to be the main affecting factors of the surface evolution. As the percentage of H2 increases from 0 to 6.25%, Ga surface-diffusion rate and the etch effect are gradually enhanced, which is beneficial to obtaining a smooth surface with low pits density. … Show more

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Cited by 15 publications
(5 citation statements)
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“…When the hydrogen flow rate is small (34.5 sccm), LT-GaN cap layer can protect most of the In atom in the quantum wells. As the hydrogen flow rate increases, the enhanced diffusion of Ga atoms plays a dominant role, which is beneficial in enhancing the 2dimensional growth and suppresses the formation of new pits especially for small pits that begin to grow in last few quantum wells but has little effect on large V-pits that have already formed before MQWs [19], [20]. Moreover, the hydrogen remove the In-rich clusters from the MQWs, therefor reducing stress accumulation may also played a significant role [12].…”
Section: Resultsmentioning
confidence: 99%
“…When the hydrogen flow rate is small (34.5 sccm), LT-GaN cap layer can protect most of the In atom in the quantum wells. As the hydrogen flow rate increases, the enhanced diffusion of Ga atoms plays a dominant role, which is beneficial in enhancing the 2dimensional growth and suppresses the formation of new pits especially for small pits that begin to grow in last few quantum wells but has little effect on large V-pits that have already formed before MQWs [19], [20]. Moreover, the hydrogen remove the In-rich clusters from the MQWs, therefor reducing stress accumulation may also played a significant role [12].…”
Section: Resultsmentioning
confidence: 99%
“…This is associated to the supply of TMIn during the QB growth that increased the hydrogen presence. As described in Zhou et al [26], it can be proposed that the hydrogen can etch parts of the layers of the MQW (most likely QB) and hence, shrinking the overall period of the MQW. Etching of GaN and InGaN by hydrogen has been widely reported in many works, e.g.…”
Section: Resultsmentioning
confidence: 99%
“…C, D: P1 < 110 nm and P2 > 210 nm), where the smaller sized pinholes dominate in sample S1 in Figure (C), whereas the surface of S2 exhibits more pinholes of larger size in Figure (D). These defects have been the subject of reports (Zhou et al ., ), and are known to first be correlated to the threading dislocations, to have a size that increases with the number of InGaN/GaN quantum wells, and to generate independently of the threading dislocations when the indium composition is increased by lowering the growth temperature below ∼750°C (Johnson et al ., ). For S1 and S2, the growth temperature of the QWs is above 750°C; therefore, this difference in the density of large pinholes may probably be related to the difference of the photoluminescence emission of both samples and the slightly larger growth time (90 s) for S2, although it was deposited at 780°C where the layer quality is expected to be more optimized.…”
Section: Resultsmentioning
confidence: 99%