2017
DOI: 10.1016/j.tsf.2016.08.030
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Surface modification through air annealing Cu2ZnSn(S,Se)4 absorbers

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Cited by 33 publications
(30 citation statements)
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“…Several papers have been published about the effect of post annealing of CZTSSe . However, due to the complexity of the starting material, especially the S/Se‐ratio and the various kind of impurities caused by the many different deposition methods used, and additionally due to the many kinds of post‐annealing chosen, such as different atmosphere type and pressure, different temperatures and performed at different stages of the solar cell fabrication, there is no general conclusion regarding a reason for the changes seen, and possibly, this might also differ from case to case.…”
Section: Resultsmentioning
confidence: 99%
“…Several papers have been published about the effect of post annealing of CZTSSe . However, due to the complexity of the starting material, especially the S/Se‐ratio and the various kind of impurities caused by the many different deposition methods used, and additionally due to the many kinds of post‐annealing chosen, such as different atmosphere type and pressure, different temperatures and performed at different stages of the solar cell fabrication, there is no general conclusion regarding a reason for the changes seen, and possibly, this might also differ from case to case.…”
Section: Resultsmentioning
confidence: 99%
“…The benefit of the air anneal was ascribed to the passivation of GB by SnO x and a reduced Cu content. In a comparison of air annealing treatments of bare CZTS and CZTSe absorbers, Zn-enrichment was seen after NH 4 OH etching in both cases, while removal of elemental selenium was only observed for CZTSe [146]. Higher annealing temperatures were beneficial for the selenide absorber and the efficiency improvements were also larger for CZTSe cells.…”
Section: Annealing Of the Heterojunctionmentioning
confidence: 94%
“…However, since this is a bulk effect, covered in other contributions of this special issue, it will not be discussed in depth here. Annealing of the absorber layer in air prior to buffer layer deposition has been shown to improve device performance by several groups [137,[145][146][147][148]. Sardashti et al [137] performed annealing in air at 300°C-400°C, followed by etching in NH 4 OH to achieve high performance devices (note that the performance of reference cells without air anneal was not given).…”
Section: Annealing Of the Heterojunctionmentioning
confidence: 99%
“…12 The selenizations were done in the same fashion as by Larsen et al 13 In order to achieve different anion ratios in the samples, the selenization temperature and duration were set for S1(S1 0 ), S2(S2 0 ), and S3(S3 0 ) in Table I as 530 C 10 min, 560 C 4 min, and 500 C, 10 min, respectively. The pure sulfide sample referred to as S4 in Table I was taken from our pervious work.…”
mentioning
confidence: 99%