The major bottleneck in fabrication
of engineered 3D nanostructures
is the choice of materials. Adding functionality to these nanostructures
is a daunting task. In order to mitigate these issues, we report a
two-photon patternable all carbon material system which can be used
to fabricate fluorescent 3D micro/nanostructures using two-photon
lithography, with subwavelength resolution. The synthesized material
system eliminates the need to use conventional two-photon absorbing
materials such as two-photon dyes or two-photon initiators. We have
used two different trifunctional acrylate monomers and carbon dots,
synthesized hydrothermally from a polyphenolic precursor, to formulate
a two-photon processable resin. Upon two-photon excitation, photogenerated
electrons in the excited states of the carbon dots facilitate the
free radical formation at the surface of the carbon dots. These radicals,
upon interaction with vinyl moieties, enable cross-linking of acrylate
monomers. Free-radical induced two-photon polymerization of acrylate
monomers without any conventional proprietary two-photon absorbing
materials was accomplished at an ultrafine subwavelength resolution
of 250 nm using 800 nm laser excitation. The effect of critical parameters
such as average laser power, carbon dot concentration, and radiation
exposure were determined for the fabrication of one-, two-, and three-dimensional
functional nanostructures, applicable in a range of domains where
fluorescence and toxicity are of the utmost importance. A fabrication
speed as high as 100 mm/s was achieved. The ability to fabricate functional
3D micro-/nanostructures is anticipated to instigate a paradigm shift
in various areas such as metamaterials, energy storage, drug delivery,
and optoelectronics to name a few.