Surface Dissolution and Diffusion of Oxygen Molecules in SiO2 Glass

Diffusion and reactions of interstitial oxygen species in amorphous SiO2: A review

“…Then the remaining interstitial O 2 is converted to SiOH group by H 2 loading because the concentration of SiOH groups is easily determined by the IR absorption spectroscopy [19,[55][56][57]. The evaluated diffusion coefficients and those determined from the PL technique described in Section 2.2 [35,36] are in excellent agreement.…”

“…The PL technique described in Section 2.1 is sensitive enough to study the dissolution and diffusion of O 2 in aSiO 2 caused by thermal annealing in air [34][35][36]. Fig.…”

Defects in oxide glasses

“…They can be diffused in stoichiometric silica from gas phase by thermal treatment [29,30,31], and they are created in concentrations up to 10 16 cm -3 by high-dose ionizing or particle irradiation in any silica sample [16,32]. Accumulation of >10 19 cm -3 of interstitial O 2 occurs in irradiated multicomponent nuclear waste-containment glasses [33].…”

Interconversion between non-bridging oxygen hole center and peroxy radical in F2-laser-irradiated SiO2 glass

“…The T f = 900°C sample was prepared by thermal anneal for 120 h at 900°C in air, which also loaded $5 · 10 15 cm À3 of O 2 from the ambient atmosphere [21,22]. To prepare T f = 1400°C sample, some of the T f = 900°C samples were subsequently annealed for 10 min at 1400°C.…”