Surface characterization of poly-2-vinylpyridine—A polymer for area selective deposition techniques

Abstract

Thin films of OH terminated poly-2-vinylpyridine (P2VP-OH), a polymer with potential for infiltration mediated thin film deposition, area selective deposition (ASD) and small feature size development via block copolymer (BCP) self-assembly, has been studied with hard X-Ray photoelectron spectroscopy (HAXPES). From the N 1s and C 1s core level spectra, accurate values for the binding energy positions of the species present in the films were obtained, providing clear evidence for signals associated to pyridine bonds. The aromatic ring on the P2VP side chain is clearly identified in the studied core levels. These observations allow for a complete understanding of the chemical environment of the polymer and provide evidence of the potential reactions that can occur with metal diffusion into P2VP. Transmission Electron Microscopy (TEM), Attenuated Total Reflection Infrared Spectroscopy (ATR IR) and Atomic Force Microscopy (AFM) measurements reveal high quality films and this work provides a reference base for this functional material in terms of its utility for ASD, BCP and subsequent atomic layer deposition (ALD) based polymer infiltration processes.

Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO2 Thin Films by Vapor-Phase Infiltration

“…81,82 Post UV/ ozone exposure, there is an increase in the SiO 2 peak because of reduced attenuation of the substrate signal. Before UV/ ozone exposure, the N 1s region (Figure 5c) has a peak at ≈399 eV associated with CN−C pyridine bonds, 83,84 while after UV/ozone exposure, the pyridine signal is absent (within XPS detection limits), indicating total removal/conversion of the brush material.…”

“…Before and after UV/ozone exposure, the Si–O and Ti–O peaks are observed at ≈532.7 and ≈530.7 eV, respectively, consistent with literature values. , Post UV/ozone exposure, there is an increase in the SiO 2 peak because of reduced attenuation of the substrate signal. Before UV/ozone exposure, the N 1s region (Figure c) has a peak at ≈399 eV associated with CN–C pyridine bonds, , while after UV/ozone exposure, the pyridine signal is absent (within XPS detection limits), indicating total removal/conversion of the brush material.…”

Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach

“…TEM and EDX cross sections of the fabricated P2VP-OH films in the outlined process has previously revealed that the resultant polymer films are ~4 nm in thickness [12]. The images in Figure 3 show the resultant cross sections arising from the ALD and oxygen plasma process.…”

“…Because of the interest in PVP as a potential acceptor, recent work has shown progress in its use via rapid, high-quality grafting of the polymer as a brush layer, and its infiltration with Al through a liquid phase approach [11]. Our previous studies have concentrated on the surface characterisation of these P2VP-OH brushes [12], and the capacity that these films have in facilitating infiltration via a Cu salt (liquid phase) inclusion process [13].…”

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

“…They can be used for ASD to facilitate selective patterning of large substrate areas [ 11 , 17 ]. For example, in poly(2-vinylpyridine) (P2VP) or poly(4-vinylpyridine) (P4VP) brushes, it is the presence of an unshared electron pair on the nitrogen atom of the pyridine ring that facilitates coordination bonding with various metal species [ 66 ]. Conversely, Polymer brushes such as polystyrene (PS) can be used for surface deactivation to block metals adhering to the substrate [ 17 , 21 , 67 , 68 ].…”