1996
DOI: 10.1016/0368-2048(95)02666-5
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Surface characterization of plasma deposited organic thin films

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Cited by 88 publications
(49 citation statements)
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“…This was attributed to the degree of monomer fragmentation resulting from the increased intensity of the plasma field. The lower deposition rate and higher substrate temperature associated with the increased RF power conditions allowed for a faster relaxation of film fragments within the growth region prior to deposition of the next layer of the film, resulting in a smoother surface [22]. This observation is clearly supported by the notable differences in roughness parameters of the two polyterpenol surfaces examined, particularly when the data from 10 μm × 10 μm scanning area sizes are compared.…”
Section: Discussionsupporting
confidence: 60%
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“…This was attributed to the degree of monomer fragmentation resulting from the increased intensity of the plasma field. The lower deposition rate and higher substrate temperature associated with the increased RF power conditions allowed for a faster relaxation of film fragments within the growth region prior to deposition of the next layer of the film, resulting in a smoother surface [22]. This observation is clearly supported by the notable differences in roughness parameters of the two polyterpenol surfaces examined, particularly when the data from 10 μm × 10 μm scanning area sizes are compared.…”
Section: Discussionsupporting
confidence: 60%
“…Numerous surface modification techniques, such as radio frequency (RF) plasma modification, surface abrasion, chemical coating, and chemical grafting can be employed to change surface properties of the substrate so as to inhibit or promote bacterial adhesion and biofilm formation [20][21][22][23][24][25][26]. In this context, the present study is an extension of our previous work on the development of a novel organic polymer coating for the prevention of growth of medically significant bacteria on three-dimensional solid surfaces.…”
Section: Introductionmentioning
confidence: 86%
“…Thus, plasma treatment used in this study to produce polymeric optical films allows polymer waveguides to be manufactured, with a numerical aperture (NA) near 0.5. Polymeric structures generally have been manufactured with an NA between 0.3 and 0.5, and the structure of silica with NA of about 0.14 is attained, as previously reported [27] . The use of chloroform as a solvent can contribute to an acceptable roughness for polymeric optical films.…”
Section: Resultsmentioning
confidence: 96%
“…Nevertheless, SIMS is very appropriate because it allows observing organic molecular ions, even thermally labile, with high sensitivity on the surface and in the film bulk [17]. A decided disadvantage, especially for the already modified solids, consists in the interference of species typical of the analyzed sample, with possibly similar secondary ions produced by the primary ion impact itself [18]. Rearrangement of fragments may occur during sputtering and ionization, which complicates identification of the spectral features, too.…”
Section: The Sims Analysis Of the Surfacementioning
confidence: 99%