2004
DOI: 10.1016/j.apsusc.2004.02.043
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Plasma irradiation effects in phthalocyanine films

Abstract: Plasma irradiation effects in copper phthalocyanine films were examined. The film surface and chemical composition were characterized by means of atomic force microscopy (AFM) and secondary ion mass spectrometry (SIMS), including SIMS profiling. #

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Cited by 7 publications
(1 citation statement)
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“…Furthermore, it is observed a homogeneous distribution of molecular aggregates varying between 20 and 70 nm in size for the analyzed surfaces whose average roughness of the film surface (rms) was around 9 nm. Results reported for PVD films with distinct thicknesses and central metallic atoms such as 200 nm of CuPc on Si and 10 nm of FePc on glass presented similar molecular aggregates at nanometer scale.…”
Section: Resultsmentioning
confidence: 51%
“…Furthermore, it is observed a homogeneous distribution of molecular aggregates varying between 20 and 70 nm in size for the analyzed surfaces whose average roughness of the film surface (rms) was around 9 nm. Results reported for PVD films with distinct thicknesses and central metallic atoms such as 200 nm of CuPc on Si and 10 nm of FePc on glass presented similar molecular aggregates at nanometer scale.…”
Section: Resultsmentioning
confidence: 51%