Surface characterisation of Pb_1−xMn_xTe alloy by atomic force microscopy and magnetic force mode

Abstract

In this paper the authors present the results of surface characterisation of a lead telluride alloy conducted by atomic force microscopy and magnetic force microscopy. Relationship between surface morphology, in the range of several nanometres, and the magnetic properties allows precise determination of nanomagnetic particles size with their distribution within a scanned area. This method allows the characterisation of nanoparticles in dimensional and magnetic sense since the paramagnetic and diamagnetic range can be examined.

Optical enhancement and selenisation models of CuInSe2 films by substrate choosing processes

“…The substrate choosing process is becoming very important due to the increase in manufacturing of electric parts among different layers 5,6. The substrate choosing process can have either only a protection function7,8 or even the finality of increasing the joined points inside the solar film cell,9,10 and it is also able to hide superficial defects or to modify surface properties, too. Nowadays, the company's objective is to produce this type of parts, minimising its costs 11.…”

The ability of using the cavitation phenomenon as a tool to modify the surface characteristics in micro- and in nano-level

“…AFM measurements were done with a JEOL SPM 5200, NanoLab microscope in tapping mode at University of Belgrade, Faculty of Mechanical Engineering. Tapping mode was selected for its ability of high resolution and non-destructive imaging of soft and sensitive samples, which is due to the lack of lateral forces (dragging) between the oscillated tip and the surface [23,28,29]. MicoMash NSC36/noAl cantilevers were used, which have 75 kHz nominal resonance frequency, 0.6 N/m nominal spring constant and 130 µm typical length.…”

“…For data evaluation the freeware Gwyddion 2.27 software was used. All AFM and EFM measurements were performed at laboratory ambient temperature and with vibration filtering at both measurement locations [23,28,29].…”