2013
DOI: 10.1109/tvlsi.2012.2192458
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Supply Noise Suppression by Triple-Well Structure

Abstract: Abstract-This brief discusses the impact of twin-and triplewell structures on power supply noise, and a substrate model for simulating the power supply noise. We observed V ss noise reduction by the resistive network of the p-substrate and V dd noise reduction by the junction capacitance of a triple-well structure on a 90-nm test chip. Measurement results also showed that the total noise reduction of a triple-well structure is superior to that of a twin-well structure. The measurement results correlate well wi… Show more

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Cited by 13 publications
(2 citation statements)
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“…With a p-substrate triple-well process, an additional deep n-well is diffused to isolate the p-well diffusions of the individual MOSFETs from the common p-substrate, allowing an independent body terminal connection for each MOSFET. The triple-well structure yields better noise characteristics as compared with the traditional twin-well structure, without increasing the gate leakage [30]. Alternatively, the triple-well structure, exhibits additional fabrication costs and area overheads due to requirements on the minimum width and spacing of deep n-wells.…”
Section: Fabrication Costsmentioning
confidence: 99%
“…With a p-substrate triple-well process, an additional deep n-well is diffused to isolate the p-well diffusions of the individual MOSFETs from the common p-substrate, allowing an independent body terminal connection for each MOSFET. The triple-well structure yields better noise characteristics as compared with the traditional twin-well structure, without increasing the gate leakage [30]. Alternatively, the triple-well structure, exhibits additional fabrication costs and area overheads due to requirements on the minimum width and spacing of deep n-wells.…”
Section: Fabrication Costsmentioning
confidence: 99%
“…In a p-substrate triple-well process, an additional deep n-well is used to isolate the p-well of each MOSFET from the p-substrate, allowing an independent body terminal connection for each MOSFET. The triple-well structure has been demonstrated to provide better noise characteristics as compared with the traditional twin-well structure, without increasing the gate leakage [29]. Alternatively, the triple-well structure, exhibits additional fabrication costs and area overheads that needs to be considered.…”
Section: Fabrication Costsmentioning
confidence: 99%