Summary Abstract: Chemical interactions at polymer–metal interfaces and the correlation with adhesion

Polymethyl methacrylate (PMMA) is a transparent thermoplastic with important applications as a positive resist for various radiation sources. For photo-patterning, PMMA is used with wavelengths shorter than 250nm, as that is the commonly accepted upper limit of effectiveness. However, we have shown patterning of non-amplified PMMA films at 254nm. Data for the etch depth as a function of dose (0 to 10 hours), developer temperature (20 • C to 30 • C), and etch time was collected. Developer speeds of up several microns a minute are possible, and the selectivity of exposed over unexposed PMMA can reach nearly 650. This demonstrates the feasibility of PMMA exposure using deep UV at 254nm.Index Terms-Polymethyl methacrylate, PMMA, DUV patterning, 254nm light source

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“…Despite the supposed poor adhesion of gold to PMMA [9], no problems with delamination were observed.…”

Section: Methodsmentioning

confidence: 74%

Exposure and Development of Poly (Methyl Methacrylate) Using 254nm Light Source and IPA/Water

Johnstone

Foulds

Parameswaran

2007

2007 Canadian Conference on Electrical and Computer Engineering

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“…The adhesion force of the interface between the Y 2 O 3 layer and the substrate was estimated using a material force tester (EZ Graph, Shimadzu Co.). A rod was adhered onto the surface of the film using epoxy resin hardened for 1 h at 120°C and then knocked over by a controlled force 12,13 . The adhesion force is given by where F is the adhesion force, r is the diameter of a rod, h is the height of the rod, and f is the applied force when the film peels off.…”

Section: Methodsmentioning

confidence: 99%

“…A rod was adhered onto the surface of the film using epoxy resin hardened for 1 h at 1201C and then knocked over by a controlled force. 12,13 The adhesion force is given by…”

Section: Methodsmentioning

confidence: 99%

Plasma‐Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process

Iwasawa

Nishimizu

Tokita

et al. 2007

Journal of the American Ceramic Society

137

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Dense yttrium oxide film was prepared on a quartz substrate by the aerosol deposition process at the room temperature. The deposition rate was very high, 60 m/h. Thick film of 10 m was easily achievable on the quartz substrate. Transmission electron microscopy showed that the film was highly dense without voids and was composed of randomly oriented Y2O3 crystallites of sizes smaller than 20 nm. The interface between the film layer and the quartz substrate was homogeneous. The film (2‐m thick) had a high transmittance (55–85%) in the wavelength region of 250‐800 nm. The mechanical properties of the film were very good. The adhesion force of the interface between the Y2O3 layer and the quartz substrate was over 80 MPa. The Vickers hardness of the film was 7.7 GPa. The film also had an excellent plasma resistance in a gas mixture of CF4/O2. Outstanding results were noted in eroded depth, surface roughness, nanostructure, and transmittance change after plasma exposure of the film.

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“…Burkstrand [8][9][10][11][12][13] reported that the interfacial adhesion strength between polymer and metal was significantly enhanced through complex formation of metal-oxygen-polymers when metal atoms were vapordeposited on oxygen-containing polymers by X-ray photoelectron spectroscopy (XPS), and the presence of interaction between the carbonyl group in PMMA and metal is verified by the changes in the XPS peak shapes of the oxygen atoms of PMMA. [9] The interaction between PMMA and oxidized aluminum surfaces was also studied using Fourier transform infra-red multiple specular reflectance spectroscopy and inelastic electron tunneling spectroscopy by Sondag and Raas.…”

Section: Introductionmentioning

confidence: 99%

Studies on Polymer-Metal Interfaces, 4. Effect of Substituent of Polymethacrylate on the Interfacial Characteristics between Polymethacrylates and Copper

Kim

Jo²

2001

Macromol. Chem. Phys.

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Summary Abstract: Chemical interactions at polymer–metal interfaces and the correlation with adhesion

Cited by 43 publications

References 0 publications

Exposure and Development of Poly (Methyl Methacrylate) Using 254nm Light Source and IPA/Water

Exposure and Development of Poly (Methyl Methacrylate) Using 254nm Light Source and IPA/Water

Plasma‐Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process

Studies on Polymer-Metal Interfaces, 4. Effect of Substituent of Polymethacrylate on the Interfacial Characteristics between Polymethacrylates and Copper

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