Exposure and Development of Poly (Methyl Methacrylate) Using 254nm Light Source and IPA/Water

Johnstone, Robert W.; Foulds, Ian G.; Parameswaran, M.

doi:10.1109/ccece.2007.417

Cited by 2 publications

(4 citation statements)

References 8 publications

(8 reference statements)

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“…(vi) The wafers were placed in a Stratalinker 2400 UV crosslinker [35], which was manufactured by Stratagene, and irradiated for 10 h. This system nominally provides 4 mW cm −2 at 254 nm. This is the exposure step for the PMMA, converting high molecular weight PMMA into low molecular weight PMMA [7][8][9][10]. Although the light from the Stratalinker 2400 is uncollimated, it was not noted to be a limitation to pattern transfer.…”

Section: Processmentioning

confidence: 99%

“…The release process consists of a bath in a 7:3 mixture of isopropanol (IPA) and MF-319. This mixture closely mimics one of the standard developers for PMMA, 7:3 mixtures of IPA and water [9,10,[37][38][39][40]. Using MF-319 instead of water introduces a small amount of tetramethylammonium hydroxide (TMAH) into the solution, which is an etchant for aluminium.…”

Section: Processmentioning

confidence: 99%

“…For example, in this work, PMMA is used as the main material. Pattern transfer is accomplished by the exposure of the PMMA film at 254 nm [7][8][9][10], lowering the average molecular weight. Dissolution rate ratios of over 1000 can be achieved for exposed PMMA [10].…”

Section: Introductionmentioning

confidence: 99%

“…However. t.he patterning of non-amplified PMl\-IA fillll~at 254 mll has been~hown to work 14,5]. This wavelengt h is just outside the accepted window, but.…”

Section: Introductionmentioning

confidence: 99%

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Self-sacrificial surface micromachining using poly(methyl methacrylate)

Johnstone¹,

Foulds²,

Parameswaran³

2008

J. Micromech. Microeng.

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This paper explains the idea of self-sacrificial surface micromachining. In a self-sacrificial process, there is no distinction between structural and sacrificial layers. Instead, during patterning, an in situ chemical change converts a structural material into a sacrificial material, or vice versa. This greatly increases the design space of a self-sacrificial process when compared to a traditional process with the same number of layers, as all layers can be used simultaneously for both structural and sacrificial purposes. To show the possibility of self-sacrificial surface micromachining, a concrete implementation was developed using poly(methyl methacrylate) (PMMA) as the material. Unexposed PMMA, with a high average molecular weight, was used as the structural material. Exposed PMMA, with a lower average molecular weight, was used as the sacrificial material. The in situ chemical change was caused by deep-UV irradiation at 254 nm.

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Section: Processmentioning

confidence: 99%

Section: Processmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

“…However. t.he patterning of non-amplified PMl\-IA fillll~at 254 mll has been~hown to work 14,5]. This wavelengt h is just outside the accepted window, but.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations