Substrate tolerant direct block copolymer nanolithography

Abstract

Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography. However, there is a need for a general approach to BC lithography that critically considers all the steps from substrate preparation to the final pattern transfer. We present a procedure that significantly simplifies the main stream BC lithography process, showing a broad substrate tolerance and allowing for efficient pattern transfer over wafer scale. PDMS-rich poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) copolymers are directly applied on substrates including polymers, silicon and graphene. A single oxygen plasma treatment enables formation of the oxidized PDMS hard mask, PS block removal and polymer or graphene substrate patterning.

Synthesis and characterization of ferrocene containing block copolymers

“…However, most of the block copolymer lithography processes need preliminary surface modification, including grafting of a neutral polymer brush layer onto the substrate to balance the surface interactions with two blocks of a given diblock copolymer . Here, we present a procedure that could potentially simplify the main stream block copolymer lithography process . PF9 35k F 25 copolymer was directly applied on silicon substrate without any pretreatment by spin‐coating from 0.1 wt% toluene solution at 2000 rpm for 30 s to give a 12 nm thin film.…”

Gold Nanoparticles Sliding on Recyclable Nanohoodoos—Engineered for Surface‐Enhanced Raman Spectroscopy

“…The details of this process can be found in the references. [32,33] Then, 26 nm of alumina is deposited onto the nanoholes using atomic layer deposition (ALD). ALD is chosen since it deposits alumina conformably onto the pre-patterned substrate.…”

Planet‐Like Nanostructures Formed by an ABC Triblock Terpolymer

“…Welldefined block copolymers composed of immiscible blocks have the ability to self-assemble into a wide array of ordered nanostructures (morphologies) and constitute an indispensable source for nanomaterial designs employed in many fields of great interest, [1] like nanoporous membranes, [2][3][4][5] biomedical applications, [6][7][8] and polymer-based organic photovoltaics. [9][10][11][12] Block copolymers find also applications in the field of nanolithography, [13][14][15][16] such as copolymers. [33] Besides chemical modification of blocks, also blending of block copolymers with other (block co)polymers can be an option for tuning the morphology.…”