Substrate rotation effect over scaling roughness exponents in Zr thin films grown by GLAD technique

Mendoza-Rincón, S.; Ospina-Arroyave, M.S.; Mateus, Diego Fernando Arias; Escobar-Rincón, Daniel

doi:10.1016/j.apsusc.2021.149660

Cited by 5 publications

(2 citation statements)

References 38 publications

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“…SRS also impacts grain size. , Sputtered atoms adsorbed on the surface of deposited thin films diffuse, forming larger grains by gathering and merging . Higher substrate rotation speeds impede this phenomenon by reducing the adatom energy, resulting in smaller grains due to lower diffusion strength.…”

Section: Resultsmentioning

confidence: 99%

Improved Reversibility of Thin-Film Solid Oxide Cells at 500 °C by Tailoring Sputtering Processes for Depositing Yttria-Stabilized Zirconia Electrolyte

Lee,

Yu,

Jang

et al. 2024

ACS Appl. Mater. Interfaces

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The present study investigates the impact of sputtering configurations on the microstructure and crystallinity of thin-film yttria-stabilized zirconia electrolytes for anodized aluminum oxide-supported all-sputtered thinfilm reversible solid oxide cells. Employing various sputtering parameters, such as target-substrate distance and substrate rotation speed, the present study reveals distinct surface characteristics and crystalline structures of thin-film yttriastabilized zirconia. The microstructure analysis includes scanning electron microscopy and atomic force microscopy examinations, uncovering the influence of the process parameters on the surface morphology, roughness, and grain size. Xray diffraction data illustrate the texture preferences and crystallite characteristics. The electrochemical characterization of the reversible solid oxide cells demonstrates that the optimized sputtering configuration significantly outperforms the others in both SOFC and SOEC modes, showing exceptional current densities of 964 mA/cm 2 at 1.3 V in electrolysis mode at 500 °C. Electrochemical impedance spectroscopy further reveals improved charge transfer reactions at the interface of the electrolyte. The enhanced electrochemical performance is attributed to the unique microstructure and crystallinity of the thin film of yttria-stabilized zirconia. The record-breaking electrolysis performance of this work at 500 °C underscores the potential of tailored sputtering parameters in optimizing the reversible solid oxide cell performance.

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Section: Resultsmentioning

confidence: 99%

Improved Reversibility of Thin-Film Solid Oxide Cells at 500 °C by Tailoring Sputtering Processes for Depositing Yttria-Stabilized Zirconia Electrolyte

Lee,

Yu,

Jang

et al. 2024

ACS Appl. Mater. Interfaces

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“…The obtained results showed that the substrate position should also be included for the set of the GLAD parameters. Additionally, Mendoza-Rincon et al [28] recently presented how the substrate rotation affects the roughness in Zr thin films grown using the GLAD technique. However, in the vast majority of papers, homemade or custom-made GLAD systems are presented [29][30][31][32][33][34][35][36][37].…”

Section: Introductionmentioning

confidence: 99%

Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film

Bronicki

Grochala

Rydosz

2022

Sensors

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In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, and substrate temperature. All parameters are crucial to control the deposition of nanostructured thin films. Therefore, the developed GLAD controller enables the control of all parameters by the scientist during the deposition. Additionally, commercially available vacuum components were used, including a three-axis manipulator. High-precision readings were tested, where the relative errors calculated using the parameters provided by the manufacturer were 1.5% and 1.9% for left and right directions, respectively. However, thanks to the formula developed by our team, the values were decreased to 0.8% and 0.69%, respectively.

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Sculptured thin films: Overcoming the limitations of surface-enhanced Raman scattering substrates

Kumar¹,

Gahlaut²,

Singh³

2022

Applied Surface Science Advances

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Substrate rotation effect over scaling roughness exponents in Zr thin films grown by GLAD technique

Cited by 5 publications

References 38 publications

Improved Reversibility of Thin-Film Solid Oxide Cells at 500 °C by Tailoring Sputtering Processes for Depositing Yttria-Stabilized Zirconia Electrolyte

Improved Reversibility of Thin-Film Solid Oxide Cells at 500 °C by Tailoring Sputtering Processes for Depositing Yttria-Stabilized Zirconia Electrolyte

Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film

Sculptured thin films: Overcoming the limitations of surface-enhanced Raman scattering substrates

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