Substrate heating and cooling during magnetron sputtering of copper target

Шаповалов, В. М.; Komlev, А. Е.; Bondarenko, Anastasia S.; Baykov, Pavel B.; Karzin, V. V.

doi:10.1016/j.physleta.2015.12.021

Cited by 16 publications

(5 citation statements)

References 10 publications

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“…It is known that during the deposition of coatings by magnetron sputtering, except for the external heating, the substrate is warmed up to a certain temperature due to the following reasons: (i) the kinetic energy of the atoms of deposited material; (ii) the release of energy during the condensation and crystallization of the film; and (iii) the energy of the secondary electrons emitted from the target. [31]. On the other hand, as already mentioned, the EBT of Co-Cr substrate leads to a phase transformation from ε + γ to γ. Glagoleva et al [32] studied the thermal properties of Co-Cr alloys and showed that the thermal conductivity of the γ phase is lower than that of the ε-phase within the temperature range of 600-1700 K. Therefore, during the deposition process, the surface consisting of a single gamma-phase structure (treated substrate) is heated more vigorously than the substrate containing a mixture of ε + γ phases (untreated substrate).…”

Section: Resultsmentioning

confidence: 74%

Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings

et al. 2019

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This study examines the effect of electron beam treatment (EBT) of Co-Cr substrate on the film growth mechanism, mechanical properties, and surface topography of TiN/TiO 2 coatings deposited by reactive magnetron sputtering. The obtained results and processes that occurred during the deposition are discussed in the context of crystallographic principles, and special attention is paid to the crystallographic orientation and growth mechanism studied by X-ray diffraction (XRD). The mechanical properties were investigated by means of nanoindentation and wear tests. The surface topography was evaluated using atomic force microscopy (AFM). The results obtained in the present study showed that polycrystalline TiN and anatase TiO 2 phases were present in all cases. Electron beam treatment of Co-Cr substrate tended to form a reorientation of the microvolumes from (111) to (200) of TiN, leading to a change in the growth mechanism from three-dimensional (Volmer-Weber) to layer-by-layer (Frank-van der Merwe). It was found that the electron beam treatment process did not significantly affect the thickness of the coatings and the deposition rate. The treatment process led to an increase in surface roughness. The higher surface roughness after the EBT process should be appropriate to support cell growth and adhesion on the surface of the deposited bilayer coating. It was demonstrated that EBT of the substrate caused a decrease in hardness of the deposited coatings from 10 to 5 GPa. The observed decrease in hardness was attributed to the change in the preferred crystallographic orientation and film growth mechanism. The hardness of the bilayer coating after the application of EBT of the Co-Cr substrate was much closer to that of human bones, which means that severe stress shielding effect could not be expected. The evaluated coefficient of friction (COF) exhibited significantly lower values in the case of EBT of the substrate compared to the untreated Co-Cr material.resistance, which depends mostly on the surface properties and can be overcome by appropriate surface modification technologies [4].During the last decades, considerable attention has been paid to surface manufacturing of materials by high-energy fluxes (HEFs) (i.e., electron and laser beams). In these technologies, the electrons or photon fluxes interact with the surface of the sample, heat the treated area, and form a thermal distribution. The rate of heating and cooling can be characterized by quite high values (about 10 5 -10 6 K/s), which lead to some structural changes in the functional properties [5][6][7][8][9][10]. The authors of [11] demonstrated an innovative approach for controlling the surface topography and tribological behavior of biomedical alloys, such as Ti6Al4V, by means of electron beam surface treatment. Other researchers [12,13] have successfully demonstrated the possibilities for enhancing the wear and corrosion properties of steel by the formation of carbon fiber-reinforced Ni-based composite coatings via laser cladding. Laser beam technologie...

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Section: Resultsmentioning

confidence: 74%

Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings

et al. 2019

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“…In the previous studies, [3][4][5][6] ZnO x N y thin films were fabricated by reactive sputtering. However, sputtering frequently causes unintentional substrate heating 9,10 and collisions of high-energy particles with the film surface during deposition, which would induce crystallization of the film. 11,12 In this study, we fabricated ZnO x N y thin films by using nitrogen-plasma-assisted pulsed laser deposition (NPA-PLD), in which the above-mentioned "heating" effects are less significant because of lower averaged power of the ablation laser (typically less than 1 W).…”

mentioning

confidence: 99%

Amorphous ZnOxNy thin films with high electron Hall mobility exceeding 200 cm2 V−1 s−1

Yamazaki

Shigematsu

Hirose

et al. 2016

Applied Physics Letters

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Zinc oxynitride (ZnOxNy) has attracted much attention as an amorphous semiconductor with high electron mobility. Recent studies reported that ZnOxNy thin films grown by sputtering contained nanocrystals, which might reduce their electron mobility through grain boundary scattering. In this study, we fabricated amorphous ZnOxNy thin films on a glass substrate by a less-energetic nitrogen-plasma-assisted pulsed laser deposition (PLD) to suppress the formation of the nanocrystals. Grown by PLD under optimized conditions, these ZnOxNy thin films exhibited extremely flat surfaces with a root-mean-squared roughness (Rrms) of less than 0.3 nm. The Hall mobility of these films exceeded 200 cm2 V−1 s−1 at a critical carrier concentration of ∼1 × 1019 cm−3, which was twice as high as the reported values for sputter-deposited films. Meanwhile, the mobility of films with larger Rrms was limited to ∼160 cm2 V−1 s−1 even at the critical carrier concentration and comparable with that of the sputter-deposited ZnOxNy films. The substantial enhancement in mobility in extremely flat ZnOxNy films demonstrated that suppressing the formation of nanocrystals is the key to fabricating amorphous ZnOxNy thin films with very high mobility.

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“…During the process of magnetron sputtering, the temperature of substrate stays in 50–200 °C. [ 27 ] Therefore, the thermal expansion between substrate and deposited material cannot be neglected. The formation of monolayers is closely related with the thermal stress and strain, which is originated from the mismatch of thermal expansion coefficients between substrate and deposited material.…”

Section: Resultsmentioning

confidence: 99%

The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering

Zhang

Čičmancová

Beneš

et al. 2022

Adv Materials Inter

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Abstract2D oxide materials have gained tremendous attention in the applications. Herein, a synthesis route of 2D WO3 materials via magnetron sputtering is reported. A deposition between 2D monolayers and thin film structure are accomplished according to the temperature of substrate. And 2D monolayers are only formed on a cooled substrate. Ag doping helps to exfoliate 2D WO3 into freestanding monolayers, in which the thickness of 2D monolayer is only ≈3 nm. The ultralarge size of 2D WO3 shows unique features from the traditional 2D material. Resistive switching device and photocatalysis are discussed as examples of application. There is a clear intermediate resistance state in the device with 2D structure. And the failure of resistive switching device is closely related with the 2D structure of WO3. In the application of photocatalysis, an improved two‐step exfoliation, achieving a stack of WO3 monolayers with a large internal volume, is utilized. The enhancements of photocatalysis are obtained with 2D WO3 after exfoliation.

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Substrate heating and cooling during magnetron sputtering of copper target

Cited by 16 publications

References 10 publications

Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings

Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings

Amorphous ZnOxNy thin films with high electron Hall mobility exceeding 200 cm2 V−1 s−1

The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering

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