Single-components or multicomponent oxide thin films are of interest for electronic and optoelectronic devices, optical applications, catalysis, corrosion protection etc. Their preparation by chemical routes is based on the hydrolytic (sol-gel process) or pyrolytic (MOCVD) conversion of precursors. Derivatives having M-O bonds, namely metal alkoxides, carboxylates or /3-diketonates, are the most common sources of metal oxides. The properties of alkoxides are appropriate for sol-gel as well as MOCVD applications, whilst the limited hydrolytic susceptibility but good volatility of P-diketonates is most convenient for MOCVD purposes. The low temperature and flexibility of sol-gel routes, and the presence of residual OH groups in the final films, are favorable for the encapsulation of organic or organometallic derivatives, the anchoring of enzymes and in general for the development of functional and composite coatings. The facile formation of heterometallic alkoxides is also attractive for the development of coatings based on multimetallic formulations. MOCVD is favorable for the buildup of heterostructures and epitaxial layers. Although metal alkoxides and P-diketonates are usually oxide precursors, nitride or sulfide films can be obtained by reacting with the appropriate reagents. Fluorinated ligands enhance volatility but often result in the formation of metal fluorides. Keywords: Alkoxides, P-diketonates, MOCVD, sol-gel, thin films, oxides, metals, fluorides, sulfides, heterometallic complexes sion protection are well-known examples.' At first, physical methods (sputtering, laser ablation, etc.) were predominant techniques for obtaining films. Chemical methods attract increasing attention, but they often require more elaborate precursors. Thin films can be prepared by spraying, dip-coating or spinning of an appropriate metal precursor solution onto a solid substrate, and are developed mainly for oxide-based materials; solubility of the precursors is a prerequisite. Metal Organic Chemical Vapor-Phase Deposition (MOCVD) techniques concern a larger variety of ceramics, oxides as well as non-oxides, and are better adapted to obtaining epitaxial coatings than are sol-gel techniques, but they need volatile and pyrolyzable precursors.The versatility of chemical routes derives largely from the variety of molecular precursors available as sources. This review sets out to illustrate the potential of precursors having M-0 bonds such as metal alkoxides M(OR),, and pdiketonates, M(OCRCHCR'O), (R, R' = alkyl, aryl, perfluoroalky1)-which can be easily purified by distillation or sublimation-for the formation of oxide thin films, but also fluoride, metal, carbide or oxycarbide, nitride and sulfide coatings, depending o n experimental conditions (temperature, substrate, inert or reactive carrier gas, etc.), and to outline the underlying problems. Metal carboxylates display attractive features for sol-gel applications, especially for the formation of fibers; however, their volatility is generally not relevant for MOCVD and they wi...