Sub-surface laser nanostructuring in stratified metal/dielectric media: a versatile platform towards flexible, durable and large-scale plasmonic writing

Siozios, A; Kalfagiannis, N.; Bellas, Dimitris V.; Bazioti, Calliope; Dimitrakopulos, G. P.; Vourlias, G.; Cranton, Wayne; Lidorikis, Elefterios; Koutsogeorgis, Demosthenes C.; Patsalas, P.

doi:10.1088/0957-4484/26/15/155301

Cited by 11 publications

(11 citation statements)

References 45 publications

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“…Finally, regarding radiation and convection losses from the top surface, they are of no consequence and in‐depth discussions and analyses of such phenomena have been reported elsewhere . A final note is that the 1D heat diffusion suffices to describe the temperature gradient in the case of thin films and substrates with high thermal conductivity.…”

Section: Laser Annealingmentioning

confidence: 99%

Recent Progress in Photonic Processing of Metal‐Oxide Transistors

Yarali

Koutsiaki

Faber

et al. 2019

Adv Funct Materials

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(1 of 37)high mobility (µ) (even in amorphous phase), wide bandgap (transparent in the visible range), and the ability to be controllably doped. Importantly, they can be grown into thin films and various nanostructures with different scalable deposition techniques, including vacuum-based methods such as physical vapor deposition (PVD) [7,8] and chemical vapor deposition (CVD) [9] as well as solution-based processes such as spray [10] and spin coating. [11] Moreover, the resulting layers can be easily patterned using standard fabrication procedures and as such can be integrated into state-of-the-art processes for (opto)electronic applications. The above-mentioned capabilities have led to a plethora of applications such as switching backplanes for displays, transparent and flexible electronics, integrated circuits (ICs), photovoltaics (PVs), organic light-emitting diodes (OLEDs), capacitors, batteries, photocatalytic devices, electrochromics and memory devices, to name but a few. [8,[12][13][14] Because of their ability to be doped, their electronic properties can be tuned from dielectrics to semiconductors and conductors. This characteristic versatility has recently been exploited to stretch the range of their applications to new technological sectors, such as plasmonics in the near infrared and midinfrared spectral ranges. [12,15] One of the driving applications of metal oxides is in thinfilm transistors (TFTs) for large area electronics such as current driven optical displays and ICs. Following the early demonstrations, [16] most effort focused on the fabrication and processing of metal oxides TFTs paying particular attention to the device performance and applications. [1,5,6,17] Especially when processed over large areas, as in the case for display applications, the complexity to precisely control the device reliability and reproducibility becomes a challenging aspect of any TFT technology. To that respect, solution-based techniques progressed rapidly due to their lower cost and higher throughput compared to vacuum-based techniques. In both cases, the metal-oxide deposition has so far been limited to high processing temperatures (>250 °C) (Figure 1a) which renders the technology incompatible with inexpensive, temperature-sensitive substrates such as polymers, the material class of choice for various high throughput manufacturing techniques such as roll-to-roll (R2R) and sheet-to-sheet (S2S)Over the past few decades, significant progress has been made in the field of photonic processing of electronic materials using a variety of light sources. Several of these technologies have now been exploited in conjunction with emerging electronic materials as alternatives to conventional hightemperature thermal annealing, offering rapid manufacturing times and compatibility with temperature-sensitive substrate materials among other potential advantages. Herein, recent advances in photonic processing paradigms of metal-oxide thin-film transistors (TFTs) are presented with particular emphasis on the use of various light sour...

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Section: Laser Annealingmentioning

confidence: 99%

Recent Progress in Photonic Processing of Metal‐Oxide Transistors

Yarali

Koutsiaki

Faber

et al. 2019

Adv Funct Materials

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“…Relevant recent experiments of a single UV laser annealing (LA) on a ceramic/metal (in particular AlN/Ag) multilayer film are discussed [17]. This LA step is capable of driving the subsurface modification of the metallic multilayers resulting into LSPR behaviour from PNPs that are formed and dispersed in a depth of several nanometre away from the surface.…”

Section: Laser Processingmentioning

confidence: 99%

“…Plasmonic nanoparticles have become an increasingly common research area as well as becoming a key component in many important applications, such as solar energy harvesting [1][2][3][4][5][6], chemical sensing via surface-enhanced spectroscopies [7,[8][9][10][11][12][13][14], cancer treatment [15,16] and optical encoding of information [17][18][19][20] to name a few. The main reason behind their adaptability, to these and other prominent applications, is their unique optical properties that allow for the manipulation of light below the diffraction limit.…”

Section: Introductionmentioning

confidence: 99%

“…Light-matter interactions offer precise energy delivery and control over the physicochemical processes in the nanoworld. Amongst the methodologies followed for creating nanoparticle arrangements and/or nanocomposite thin films, laser annealing (LA) has been proven to be simple and versatile, providing freedom of design, fast processing, compatibility with large-scale manufacturing and allowing for the use of inexpensive flexible substrates [17,19,47], due to the ultra-fast and macroscopically cold process. For example, LA of a thin metal film results into nanoparticle arrangements on top of a substrate [11,13,14,[47][48][49][50][51][52][53][54], while embedded nanoparticles in a dielectric matrix can be fabricated in large scale through the LA of a stack of alternating ultrathin layers of a metal and a dielectric [17,18].…”

Section: Introductionmentioning

confidence: 99%

“…Pressure: In certain cases, low vacuum or high pressure application during LA (of any gaseous environment) is considered advantageous to avoid detrimental effects of ablation [17].…”

mentioning

confidence: 99%

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Laser Annealing as a Platform for Plasmonic Nanostructuring

Kalfagiannis¹,

Koutsogeorgis²,

ElefteriosLidorikis³

et al. 2017

Nanoplasmonics - Fundamentals and Applications

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Nanoconstruction of metals is a significant challenge for the future manufacturing of plasmonic devices. Such a technology requires the development of ultra-fast, high-throughput and low cost fabrication schemes. Laser processing can be considered as such and can potentially represent an unrivalled tool towards the anticipated arrival of modules based in metallic nanostructures, with an extra advantage: the ease of scalability. Specifically, laser nanostructuring of either thin metal films or ceramic/metal multilayers and composites can result on surface or subsurface plasmonic patterns, respectively, with many potential applications. In this chapter, the photo-thermal processes involved in surface and subsurface nanostructuring are discussed and processes to develop functional plasmonic nanostructures with pre-determined morphology are demonstrated. For the subsurface plasmonic conformations, the temperature gradients that are developed spatially across the metal/dielectric structure during the laser processing can be utilized. For the surface plasmonic nanoassembling, the ability to tune the laser's wavelength to either match the absorption spectral profile of the metal or to be resonant with the plasma oscillation frequency can be utilised, i.e. different optical absorption mechanisms that are size-selective can be probed. Both processes can serve as a platform for stimulating further progress towards the engineering of large-scale plasmonic devices.

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Laser-driven structural modifications and diffusion phenomena of plasmonic AlN/Ag stratified films

Delli

Bazioti

Pliatsikas

et al. 2016

Surface and Coatings Technology

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Laser annealing (LA) of AlN/Ag multilayers was proven to be an effective process to control the structure and dispersion of Ag into the AlN resulting in intense coloration via the localized surface plasmon resonance, which is of particular importance for decorative applications.In this work we present a study of the structural changes occurring in various AlN/Ag multilayers after LA, in an effort to establish firm knowledge of the diffusion and re-nucleation mechanisms that occur during the laser process. We investigate the effect of the basic LA parameters, such as the laser wavelength (193 and 248 nm), fluence (400-700 mJ/cm 2 ), pressure (1 and 10 Bar) and number of pulses (1 and 2) and we show that the main processes is the Ag particle enhancement close to the film surface as a result of additive outidiffusion Ag and the formation of nanoparticles of varying size.

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Sub-surface laser nanostructuring in stratified metal/dielectric media: a versatile platform towards flexible, durable and large-scale plasmonic writing

Cited by 11 publications

References 45 publications

Recent Progress in Photonic Processing of Metal‐Oxide Transistors

Recent Progress in Photonic Processing of Metal‐Oxide Transistors

Laser Annealing as a Platform for Plasmonic Nanostructuring

Laser-driven structural modifications and diffusion phenomena of plasmonic AlN/Ag stratified films

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