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2012
DOI: 10.1109/lpt.2012.2225612
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Sub-Micron Lithography Using InGaN Micro-LEDs: Mask-Free Fabrication of LED Arrays

Abstract: The fabrication of gallium-nitride (GaN)-based light-emitting diode (LED) arrays by a direct writing technique, itself using micron-sized LEDs (micro-LEDs), is reported. CMOSdriven ultraviolet GaN-based micro-LED arrays are used to pattern photoresist layers with feature sizes as small as 500 nm. Checkerboard-type square LED array devices are then fabricated using such photoresist patterns based on either single pixel or multipixel direct writing, and implemented as part of a completely mask-less process flow.… Show more

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Cited by 34 publications
(23 citation statements)
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“…A flexible grating replicating the features of the master is then obtained. An atomic force microscopy (AFM) image and a profile scan of a typical grating fabricated this way can be found in [7]. Further fabrication details specific to each type of lasers are given in the following sub-sections.…”
Section: Structure Of the Mechanically-flexible Lasersmentioning
confidence: 99%
See 1 more Smart Citation
“…A flexible grating replicating the features of the master is then obtained. An atomic force microscopy (AFM) image and a profile scan of a typical grating fabricated this way can be found in [7]. Further fabrication details specific to each type of lasers are given in the following sub-sections.…”
Section: Structure Of the Mechanically-flexible Lasersmentioning
confidence: 99%
“…They also benefit from potential low production cost and toxicity while their 'soft matter' nature offers great processing flexibility, enabling for example a wide range of novel bendable and mechanically-tunable devices such as OS lasers [2][3][4][5][6][7][8]. Wavelength electrical-tuning of OS lasers has also been shown [9][10][11].…”
Section: Introductionmentioning
confidence: 99%
“…Finally, the use of these light-structured LEDs was investigated for maskless photolithography, an application in which the compactness, high-brightness and high resolution of sources are key requirements. A 405 nm light-structured LED displaying 10 μm-wide bars separated by gaps of increasing width from 1 μm up to 10 μm (as shown in figure 1(b)) was used to investigate the resolution limit of the pattern transfer from the light-structured LED to a PR-coated sample using a custom-made imaging setup described previously [5]. An LED was driven at an injection current of 60 mA, providing an average optical power density of ∼1.3 W cm −2 on the test sample placed at the focal plane.…”
Section: Maskless Photolithographymentioning
confidence: 99%
“…However, various emerging display applications, including wearable devices, head-mounted, and large-area displays require miniaturized chips composed of arrays of micro-scale LED elements (micro-LED) with high density with the lateral dimension down to less than 100 µm × 100 µm [1][2][3][4][5]. Due to the benefits provided by miniaturization, micro-LEDs are considered to possess great potential in multi-site neuron stimulation [6,7], miniaturized optoelectronic tweezers [8], optical cochlear implants [9], and mask-free lithography [10]. Additionally, a short differential carrier lifetime resulting from reduced capacitance and increased current density in micro-LEDs makes it also an appealing candidate for high-speed visible light communications (VLC) [11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%