2017
DOI: 10.1016/j.mee.2016.11.019
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Sub-50-nm structure patterning by combining nanoimprint lithography and anisotropic wet etching without considering original mold resolution

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Cited by 13 publications
(6 citation statements)
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“…It also needs mask and resist, and the main difference is lain in the source of radiation . X‐ray radiation is selectively absorbed by the mask and thus a pattern could be formed . Multifunctional X‐ray lithography station at VEPP‐3 was considered by Goldenberg et al to fabricate microstructure, the spectrum of handling the specimens during irradiation was expanded and it became possible to vary the irradiation spectrum to separate the “soft” or “hard” component of the radiation spectrum.…”
Section: Fabrication Of Superhydrophobic Surfacementioning
confidence: 99%
“…It also needs mask and resist, and the main difference is lain in the source of radiation . X‐ray radiation is selectively absorbed by the mask and thus a pattern could be formed . Multifunctional X‐ray lithography station at VEPP‐3 was considered by Goldenberg et al to fabricate microstructure, the spectrum of handling the specimens during irradiation was expanded and it became possible to vary the irradiation spectrum to separate the “soft” or “hard” component of the radiation spectrum.…”
Section: Fabrication Of Superhydrophobic Surfacementioning
confidence: 99%
“…High viscous UV curable resins generally exhibit high selectivity for dry etching [13] and various refractive indices [14]. The combination of the latter benefit with lab-on-a-chip [15][16][17] technology is expected to result in great progress in biology [18] and chemical engineering [19].…”
Section: Introductionmentioning
confidence: 99%
“…Nano & Life Innovation, Waseda University. Nanosized patterns were fabricated by UV-NIL and RIE according to our previous report 15 . First, a 200 nm thick silicon dioxide layer was deposited by IBS on a glass substrate as a nano structuring layer.…”
Section: Materials and Methods Titanium Substrates Grade 4 Pure Titamentioning
confidence: 99%