Sub-30-nm patterning on quartz for imprint lithography templates

Srinivasan, Charan; Hohman, J. Nathan; Anderson, Mary Elizabeth; Weiss, Paul S.; Horn, Mark W.

doi:10.1063/1.2963982

Cited by 15 publications

(11 citation statements)

References 26 publications

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“…Other key studies investigated the protonation of the terminal carboxylic acid and its impact on coordinating the copper ions [42,43]. These multilayers have application as "molecular rulers" to measure out or build up precise nanoscale lithographic resists, which can define spacings between metal features [29][30][31][32]34]. These films are often represented by a figure showing a 1:1 ratio for metal:molecule and an equal density of the additional layers relative to the base layer ( Fig.…”

Section: Introductionmentioning

confidence: 99%

“…Metalorganic coordinated multilayers are a hybrid inorganic-organic system characterized by the ability to tailor and tune thickness in the subnanometer scale with chemically selective deposition [15][16][17][18][19][20][21][22][23][24][25][26]. These metal-organic coordinated multilayers are simple to fabricate as they do not require high energy or vacuum systems, and they have been studied for applications in lithography, electronics, and photonics [27][28][29][30][31][32][33][34][35][36][37][38][39][40].…”

Section: Introductionmentioning

confidence: 99%

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Metal–organic coordinated multilayer film formation: Quantitative analysis of composition and structure

et al. 2015

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Metal-organic coordinated multilayers are self-assembled thin films fabricated by alternating solutionphase deposition of bifunctional organic molecules and metal ions. The multilayer film composed of α,ω-mercaptoalkanoic acid and Cu (II) has been the focus of fundamental and applied research with its robust reproducibility and seemingly simple hierarchical architecture. However, internal structure and composition have not been unambiguously established. The composition of films up to thirty layers thick was investigated using Rutherford backscattering spectrometry and particle induced X-ray emission. Findings show these films are copper enriched, elucidating a 2:1 ratio for the ion to molecule complexation at the metal-organic interface. Results also reveal that these films have an average layer density similar to literature values established for a selfassembled monolayer, indicating a robust and stable structure. The surface structures of multilayer films have been characterized by contact angle goniometry, ellipsometry, and scanning probe microscopy. A morphological transition is observed as film thickness increases from the first few foundational layers to films containing five or more layers. Surface roughness analysis quantifies this evolution as the film initially increases in roughness before obtaining a lower roughness comparable to the underlying gold substrate. Quantitative analysis of topographical structure and internal composition for metal-organic coordinated multilayers as a function of number of deposited layers has implications for their incorporation in the fields of photonics and nanolithography.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Metal–organic coordinated multilayer film formation: Quantitative analysis of composition and structure

et al. 2015

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“…Traditional lithographic fabrication on a quartz surface includes a complex process of mask deposition, exposure, etching and mask removal [4,5]. As device dimension has been down to nanoscale, traditional lithography hardly provides feasible nanofabrication on the quartz surface because of its involute process and limited resolution [6].…”

Section: Introductionmentioning

confidence: 99%

Maskless and low-destructive nanofabrication on quartz by friction-induced selective etching

Song

Cui

et al. 2013

Nanoscale Res Lett

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A low-destructive friction-induced nanofabrication method is proposed to produce three-dimensional nanostructures on a quartz surface. Without any template, nanofabrication can be achieved by low-destructive scanning on a target area and post-etching in a KOH solution. Various nanostructures, such as slopes, hierarchical stages and chessboard-like patterns, can be fabricated on the quartz surface. Although the rise of etching temperature can improve fabrication efficiency, fabrication depth is dependent only upon contact pressure and scanning cycles. With the increase of contact pressure during scanning, selective etching thickness of the scanned area increases from 0 to 2.9 nm before the yield of the quartz surface and then tends to stabilise after the appearance of a wear. Refabrication on existing nanostructures can be realised to produce deeper structures on the quartz surface. Based on Arrhenius fitting of the etching rate and transmission electron microscopy characterization of the nanostructure, fabrication mechanism could be attributed to the selective etching of the friction-induced amorphous layer on the quartz surface. As a maskless and low-destructive technique, the proposed friction-induced method will open up new possibilities for further nanofabrication.

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“…The size of this gap is defined by the thickness of the multilayer. Utilization of the molecular-ruler process in this way provides a general and widely applicable method to fabricate registered, nanometer-scale features for potential applications including nanoelectronics, molecular-scale junctions, and electrochemical sensors [17–18 20–21 25–26]. …”

Section: Resultsmentioning

confidence: 99%

Expanding the molecular-ruler process through vapor deposition of hexadecanethiol

Patron¹,

Hooker²,

Santavicca³

et al. 2017

Beilstein J. Nanotechnol.

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The development of methods to produce nanoscale features with tailored chemical functionalities is fundamental for applications such as nanoelectronics and sensor fabrication. The molecular-ruler process shows great utility for this purpose as it combines top-down lithography for the creation of complex architectures over large areas in conjunction with molecular self-assembly, which enables precise control over the physical and chemical properties of small local features. The molecular-ruler process, which most commonly uses mercaptoalkanoic acids and metal ions to generate metal-ligated multilayers, can be employed to produce registered nanogaps between metal features. Expansion of this methodology to include molecules with other chemical functionalities could greatly expand the overall versatility, and thus the utility, of this process. Herein, we explore the use of alkanethiol molecules as the terminating layer of metal-ligated multilayers. During this study, it was discovered that the solution deposition of alkanethiol molecules resulted in low overall surface coverage with features that varied in height. Because features with varied heights are not conducive to the production of uniform nanogaps via the molecular-ruler process, the vapor-phase deposition of alkanethiol molecules was explored. Unlike the solution-phase deposition, alkanethiol islands produced by vapor-phase deposition exhibited markedly higher surface coverages of uniform heights. To illustrate the applicability of this method, metal-ligated multilayers, both with and without an alkanethiol capping layer, were utilized to create nanogaps between Au features using the molecular-ruler process.

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Sub-30-nm patterning on quartz for imprint lithography templates

Abstract: Articles you may be interested inSub-20nm silicon patterning and metal lift-off using thermal scanning probe lithography

Cited by 15 publications

References 26 publications

Metal–organic coordinated multilayer film formation: Quantitative analysis of composition and structure

Metal–organic coordinated multilayer film formation: Quantitative analysis of composition and structure

Maskless and low-destructive nanofabrication on quartz by friction-induced selective etching

Expanding the molecular-ruler process through vapor deposition of hexadecanethiol

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