Sub-100 nm Triangular Nanopores Fabricated with the Reactive Ion Etching Variant of Nanosphere Lithography and Angle-Resolved Nanosphere Lithography

Abstract

Nanosphere lithography (NSL) is combined with reactive ion etching (RIE) to fabricate ordered arrays of in-plane, triangular cross-section nanopores. Nanopores with in-plane widths ranging from 44 to 404 nm and depths ranging from 25 to 250 nm are demonstrated. The combination of angle-resolved nanosphere lithography (AR NSL) and RIE yields an additional three-fold reduction in nanopore size.

Fabrication of nanopillars by nanosphere lithography

“…During each of the "Bosch" etch cycles, the exposed silicon areas were first etched with SF 6 and then passivated with a polymer formed by C 4 F 8 . Since the bombardment of the reactive ions was directional and perpendicular to the surface of the substrate in the deep RIE etcher, the bottoms of the etched wells were preferentially etched during the etch phase of the etch cycle.…”

Enhanced Raman Scattering as a Probe for 4-Mercaptopyridine Surface-modified Copper Oxide Nanocrystals

“…9 Until now, SERS experiments have been restricted to molecules adsorbed on the surfaces of noble metals and transitional metals. [10][11][12][13] Only a few reports describing SERS experiments on nonmetallic surfaces are available: Quagliano has detected Raman signals from pyridine molecules adsorbed on InAs/GaAs surfaces.…”

Integration Between Template‐Based Nanostructured Surfaces and Biosensors

“…The dimensions and pillar profile are determined by etch time, gas, pressure, and mask integrity. Other geometric bodies formed on the colloidal lithographic mask may be hemispherical protrusions [42,88], cups [89], nanowells [90][91][92] or rings [93][94][95].…”