2019
DOI: 10.1109/ted.2019.2942396
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Sub-10-nm Silicene Nanoribbon Field Effect Transistor

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Cited by 41 publications
(21 citation statements)
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“…We have shown in our previous work, 19 that a bandgap can be generated in ZSiNRs by co-decorating them with Li and Cl atoms. In our previous study, we had employed semi-empirical Huckel model for evaluating the band structure.…”
Section: Resultsmentioning
confidence: 93%
See 1 more Smart Citation
“…We have shown in our previous work, 19 that a bandgap can be generated in ZSiNRs by co-decorating them with Li and Cl atoms. In our previous study, we had employed semi-empirical Huckel model for evaluating the band structure.…”
Section: Resultsmentioning
confidence: 93%
“…18 Recently, the authors proposed a method of generating bandgap in silicene nanoribbons (SiNRs) by co-decorating them with Lithium atoms on one side and chlorine atoms on the other side. 19 The obtained bandgap is found to be suitable for electronic and optoelectronic applications. Though the electronic device application has been demonstrated by the authors in the same paper, 19 however, the optoelectronic applications were not explored.…”
Section: Introductionmentioning
confidence: 93%
“…Apart from graphene, another novel material called silicene has received a lot of attention in recent years. Silicene, regarded as the 'silicon version of graphene,' also has a hexagonal structure [117][118][119]. Silicene is the single-layer version of graphene, having the constituent Si atoms arranged in a hexagonal form via covalent bonds [22,23].…”
Section: Photodetectors Based On 2d-heterostructuresmentioning
confidence: 99%
“…However, the scaling of such devices below 32/22nm technology node becomes difficult due to gate oxide tunneling, parasitic and short channel effects (SCE) [3]. Various solutions have been put forward to overcome such difficulties [4][5]. Planar structure with an ultra-thin body SOI MOSFET, tri-gate structures etc.…”
Section: Introductionmentioning
confidence: 99%