2020
DOI: 10.1117/1.jpe.10.024001
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Study on spray-pyrolyzed In2S3 thin films, targeted as electron transport layer in solar energy

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Cited by 4 publications
(3 citation statements)
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“…Peak diffraction (1 0 15) is characteristic of the formation of the tetragonal structure, which contrasts with the cubic structure. Notably, the peak diffraction (1 0 15) of the crystallization characteristic tetragonal sequentially because of the diffraction peaks of the two-crystal cubic and tetragonal structures overlapped 44 .
Figure 3 Comparison of XRD diffraction spectra of In 2 S 3 layers with the standard card.
…”
Section: Resultsmentioning
confidence: 99%
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“…Peak diffraction (1 0 15) is characteristic of the formation of the tetragonal structure, which contrasts with the cubic structure. Notably, the peak diffraction (1 0 15) of the crystallization characteristic tetragonal sequentially because of the diffraction peaks of the two-crystal cubic and tetragonal structures overlapped 44 .
Figure 3 Comparison of XRD diffraction spectra of In 2 S 3 layers with the standard card.
…”
Section: Resultsmentioning
confidence: 99%
“…It must be stressed that the surface temperature should be constant over the sample. The rate of deposition 4 ml/min, 17 cm height (distance between hot plate and nozzle), and 250 °C deposition temperature are the optimum conditions for In 2 S 3 deposition 44 . The carrier gas was the air with a constant rate of 3 L/min.…”
Section: Methodsmentioning
confidence: 99%
“…In addition, In 2 S 3 is an n-type semiconductor that crystallizes at atmospheric pressure in three polymorphic forms (named α, β, and γ) as a function of temperature [ 1 ]. These remarkable characteristics of In 2 S 3 combined with its eco-friendly nature [ 2 , 3 ] make it well-suited for use in a variety of applications that are fabricated by different processing methods [ 4 , 5 , 6 , 7 ]. In 2 S 3 is generally used in photovoltaic applications [ 8 ], semiconductor batteries [ 9 ], and photoelectrochemical cells [ 10 , 11 ].…”
Section: Introductionmentioning
confidence: 99%