2019
DOI: 10.1016/j.solmat.2019.02.025
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Study of thin film poly-crystalline CdTe solar cells presenting high acceptor concentrations achieved by in-situ arsenic doping

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Cited by 67 publications
(35 citation statements)
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“…In Figure 7b, we observe a small increase in the slope of the EQE at long wavelengths for devices on which mild CHT was carried out. This feature has been previously reported for CdTe:As solar cells with varied As doping [11], to be associated with increasing N A , and is consistent with our measured acceptor concentration (see Figure 7c).…”
Section: Resultssupporting
confidence: 93%
See 1 more Smart Citation
“…In Figure 7b, we observe a small increase in the slope of the EQE at long wavelengths for devices on which mild CHT was carried out. This feature has been previously reported for CdTe:As solar cells with varied As doping [11], to be associated with increasing N A , and is consistent with our measured acceptor concentration (see Figure 7c).…”
Section: Resultssupporting
confidence: 93%
“…In our baseline CdTe thin film solar cell structure (Figure 1a), according to a superstrate configuration, a heavily As-doped (~10 19 atoms cm −3 ) CdTe cap layer, denoted by the p+-CdTe back contact layer (BCL) was found to lower the device’s series resistance [5], resulting in efficiencies as high as 13.0% being achieved. However, dopability with CdTe is challenging, as a recent study by Kartopu et al [11] has shown As doping of polycrystalline CdTe with an upper limit of ~3 × 10 16 cm −3 . Nevertheless, p-type doping of ZnTe to very high levels is achievable in comparison, where doping concentrations as high as 1 × 10 18 cm −3 for in-situ doped ZnTe:As have been reported [12,13].…”
Section: Introductionmentioning
confidence: 99%
“…a) depicts a linear rise in open-circuit voltage (VOC) with (𝑁 > 2 × 10 𝑐𝑚 ). Fig.5(b) depicts a linear reduction in short-circuit current density (JSC) with (𝑁 > 2 × 10 𝑐𝑚 ), this can be ascribed to an increase in free carrier charge recombination inside the bulk[64]. On the other hand, fill factor (FF%) as shown in Fig.5 (c), increases linearly with (𝑁 > 2 × 10 𝑐𝑚 ).…”
mentioning
confidence: 86%
“…Концентрация дырок в слоях, выращенных при отношении ДИПТ/ДМК = 1, увеличивается с продолжительностью отжига и достигает максимального значения p = 1 • 10 17 см −3 в течение 60 мин. Этот результат несколько выше значений, полученных в [11,12,15,16], и близок к рекордным значениям концентраций дырок p = (1−2) • 10 17 см −3 в легированных мышьяком эпитаксиальных слоях CdTe, полученных методом MOCVD [6,13,21,22]. Тем не менее доля электрически активного мышьяка в слоях CdTe, полученных с использованием ДИПТ (∼ 4.5%), существенно ниже доли в слоях CdTe, полученных ранее с использованием ДЭТ (10−85%) [6].…”
Section: результаты и их обсуждениеunclassified
“…Курицын лять концентрацией собственных дефектов и изменять условия вхождения примеси в слои за счет использования разнообразных прекурсоров и их соотношений. В качестве источников примеси мышьяка в методе MOCVD применяют арсин и его производные [10][11][12], а в последнее время наибольшее применение находит трис-диметила-миноарсин (ТДМАА, TDMAAs, As[N(CH 3 ) 2 ] 3 ) [6,[13][14][15][16]. Это связано с его невысокой температурой распада (50% при 350 • С [17]), а также низким давлением пара, что обеспечивает лучший контроль уровня легирования.…”
Section: Introductionunclassified