Study of the limitation of energy dispersive reflectivity with synchrotron radiation

Lee, Chih‐Hao; Yu, Kuan-Li; Lee, Hsin-Chih

doi:10.1016/s0168-9002(01)00728-8

Cited by 3 publications

(5 citation statements)

References 6 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Hence, to cover the q-interval of interest, several patterns must be collected in correspondence to a set of angular values [67]. Alternatively, the use of a multi-element detector, in a linear array configuration, was suggested [73].…”

Section: Comparison Of the Ed Mode With The Ad One: Advantages And Dr...mentioning

confidence: 99%

“…Another way to reduce the pile-up effects consists of decreasing the shaping time of the amplifier, so that a higher number of photons per unit time can be processed before the energy spectrum distortion becomes significant. This is particularly useful if an intense synchrotron radiation emitted by a bending magnet is utilized as a primary beam [73].…”

Section: Pile-up Effectmentioning

confidence: 99%

See 1 more Smart Citation

The energy dispersive x-ray reflectometry as a unique laboratory tool for investigating morphological properties of layered systems and devices

Albertini¹,

Paci²,

Generosi³

2006

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

The principles and technical aspects of the laboratory energy dispersive x-ray reflectometry technique (EDXR) are reviewed. X-ray reflectometry enables us to retrieve information on the morphological parameters (film thickness, surface and interface roughness) of thin films, layered materials and devices at the Å resolution. In the energy dispersive mode it makes use of a polychromatic beam and the energy scan is carried out by means of an energy sensitive detector, allowing us to keep the experimental geometry unchanged during data collection. The advantages offered by the technique, in particular when accurate time-resolved studies are to be performed, are outlined. An overview of the most significant works in the field is also reported, in order to present the wide range of its possible applications. The paper was written taking into account the necessity to provide a comprehensive description of this unusual laboratory technique. The first part of the manuscript is, therefore, devoted to the general aspects of EDXR: theoretical bases, experimental characteristics, advantages and drawbacks in comparison with alternative techniques, instrumental effects that may occur and information that can be gained by its application. In the second part of the paper, we resume the main literature results obtained by applying it to a variety of systems, to show examples of the possibilities it offers. Among the experiments reported, in particular much emphasis is given to the time-resolved in situ ones (for example, devices upon working and systems undergoing morphological modifications), which probably represents the most original use of this method.

show abstract

Section: Comparison Of the Ed Mode With The Ad One: Advantages And Dr...mentioning

confidence: 99%

Section: Pile-up Effectmentioning

confidence: 99%

The energy dispersive x-ray reflectometry as a unique laboratory tool for investigating morphological properties of layered systems and devices

Albertini¹,

Paci²,

Generosi³

2006

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

show abstract

“…One is to use a white x-ray beam and an energy dispersive detector. [9][10][11][12] However, the heat load on the sample due to the white beam is tremendous and samples can easily be damaged. Furthermore x-ray sources such as x-ray tubes and undulator sources cannot deliver high-intensity white beams with uniform energy distribution of the photons.…”

Section: Introductionmentioning

confidence: 99%

“…Finally, the time resolution and q-resolution are strongly limited by the energy resolution and the dynamic range of the detector. [9][10][11][12] Another approach is to generate a strongly focused x-ray beam and to make use of the divergence of the beam for an angular dispersive reflectivity. 13 Here the q-space and resolution are restricted by the maximum opening angle of the focused beam.…”

Section: Introductionmentioning

confidence: 99%

A new setup for high resolution fast X-ray reflectivity data acquisition

Buffet

Pflaum

Ehnes

et al. 2016

Review of Scientific Instruments

View full text Add to dashboard Cite

A new method for fast x-ray reflectivity data acquisition is presented. The method is based on a fast rotating, slightly tilted sample reflecting to a stationary mounted position sensitive detector and it allows for measurements of reflectivity curves in a quarter of a second. The resolution in q-space mainly depends on the beam properties and the pixel size of the detector. Maximum q z -value of 1 Å −1 can be achieved. The time-temperature depending structure changes of poly(Nisopropylacrylamide) thin films were investigated in situ by applying the fast-reflectivity setup. The results are presented in this paper as illustration of the method and proof of principle. Published by AIP Publishing. [http://dx

show abstract

“…X-ray reflectivity is traditionally measured as a function of the scattering vector, either on varying the scattering angle (angularly resolved) or the wavelength (in an energy-dispersive mode). Only with energy-dispersive reflectivity with a sample and a detector at fixed angles is it possible to maintain the pace of measurement in real time, but this method requires a white incident X-ray beam, and the ability to acquire statistically satisfactory data is restricted by the maximum counting rate of the detector (Lee et al, 2001). In this work, we measured reflectivity with a fixed angle to extract valuable data using a mono-energetic beam.…”

Section: Introductionmentioning

confidence: 99%

Surface morphology of sputtered Ta₂O₅thin films on Si substrates from X-ray reflectivity at a fixed angle

et al. 2008

Self Cite

View full text Add to dashboard Cite

The temporal variation of the surface morphology of Ta 2 O 5 films on Si substrates has been measured using X-ray reflectivity at a fixed angle during radio-frequency magnetron sputtering. During an early stage of growth of polycrystalline Ta 2 O 5 , the variation of surface roughness revealed a morphology of island nucleation and island coalescence. For a thickness greater than 7 nm, the surface roughness increased, to more than 2 nm at a thickness of 80 nm. For crystalline Ta 2 O 5 films, the density of sputtered Ta 2 O 5 films increased and attained the bulk value for a film only at a thickness greater than 80 nm. For an amorphous sputtered film, the surface was less rough and the density was less than that for a crystalline film. research papers J. Appl. Cryst. (2008). 41, 356-362 Hsin-Yi Lee et al. Surface morphology of Ta 2 O 5 thin films 361

show abstract

Study of the limitation of energy dispersive reflectivity with synchrotron radiation

Cited by 3 publications

References 6 publications

The energy dispersive x-ray reflectometry as a unique laboratory tool for investigating morphological properties of layered systems and devices

The energy dispersive x-ray reflectometry as a unique laboratory tool for investigating morphological properties of layered systems and devices

A new setup for high resolution fast X-ray reflectivity data acquisition

Surface morphology of sputtered Ta₂O₅thin films on Si substrates from X-ray reflectivity at a fixed angle

Contact Info

Product

Resources

About

Study of the limitation of energy dispersive reflectivity with synchrotron radiation

Cited by 3 publications

References 6 publications

The energy dispersive x-ray reflectometry as a unique laboratory tool for investigating morphological properties of layered systems and devices

The energy dispersive x-ray reflectometry as a unique laboratory tool for investigating morphological properties of layered systems and devices

A new setup for high resolution fast X-ray reflectivity data acquisition

Surface morphology of sputtered Ta2O5thin films on Si substrates from X-ray reflectivity at a fixed angle

Contact Info

Product

Resources

About

Surface morphology of sputtered Ta₂O₅thin films on Si substrates from X-ray reflectivity at a fixed angle