Study of sputtered molybdenum nitride as a diffusion barrier

Anitha, V. P.; Bhattacharya, Anindya; Patil, Nagesh D.; Major, S.S.

doi:10.1016/0040-6090(93)90687-k

Cited by 51 publications

(23 citation statements)

References 20 publications

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“…6 Although g-Mo 2 N is the most commonly synthesized form by thermal treatment of MoO 3 , 9,12,19,21 there is also evidence in the literature for the formation of a body centred tetragonal b-nitride phase with a Mo/N ratio in the range 2.0-2.6. 13,[22][23][24][25][26] The literature dealing with the temperature programmed synthesis of Mo nitrides is still quite limited and we could not find any comprehensive analysis of the mechanism(s) involved in the formation of b-Mo nitride from MoO 3 . It is, however, worth noting a number of reports that deal (in part) with Mo nitride preparation, 13,23,24,[27][28][29] physical/chemical properties 6 and morphology.…”

Section: Introductionmentioning

confidence: 99%

“…Transition-metal nitrides in general, and Mo nitride in particular, exhibit a combination of properties that have resulted in multiple applications as coatings/structural components, 1 high performance magnets, 2 in electronic and optical devices 3 and as catalytic materials. 4,5 Conventional preparative routes have involved either (a) high temperature (1400-1900 K) reaction of the base metal and elemental nitrogen, 6 (b) carbothermal nitridation of metal oxides 6 or (c) a self-propagating high temperature synthesis.…”

Section: Introductionmentioning

confidence: 99%

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β-Molybdenum nitride: synthesis mechanism and catalytic response in the gas phase hydrogenation of p-chloronitrobenzene

Cárdenas‐Lizana

Gómez‐Quero

Perret

et al. 2011

Catal. Sci. Technol.

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UvA-DARE is a service provided by the library of the University of Amsterdam (http://dare.uva.nl) UvA-DARE (Digital Academic Repository)β-Molybdenum nitride: synthesis mechanism and catalytic response in the gas phase hydrogenation of p-chloronitrobenzene Cárdenas-Lizana, F.; Gómez Quero, S.; Perret, N.; Kiwi-Minsker, L.; Keane, M.A. Disclaimer/Complaints regulationsIf you believe that digital publication of certain material infringes any of your rights or (privacy) interests, please let the Library know, stating your reasons. In case of a legitimate complaint, the Library will make the material inaccessible and/or remove it from the website. Please Ask the Library: http://uba.uva.nl/en/contact, or a letter to: Library of the University of Amsterdam, Secretariat, Singel 425, 1012 WP Amsterdam, The Netherlands. You will be contacted as soon as possible. A temperature programmed treatment of MoO 3 in flowing N 2 + H 2 has been employed to prepare b-phase molybdenum nitride (b-Mo 2 N) which has been used to promote, for the first time, the catalytic hydrogenation of p-chloronitrobenzene. The reduction/nitridation synthesis steps have been monitored in situ and the starting oxide, reaction intermediates and nitride product have been identified and characterized by powder X-ray diffraction (XRD), diffuse reflectance UV-Vis (DRS UV-Vis), elemental analysis, scanning electron microscopy (SEM) and BET/pore volume measurements. Our results demonstrate that MoO 3 -b-Mo 2 N is a kinetically controlled process where an initial reduction stage generates (sequentially) MoO 2 and Mo as reaction intermediates with a subsequent incorporation of N to produce b-Mo 2 N. SEM analysis has established that the transformation is non-topotactic with a disruption to the platelet morphology that characterizes MoO 3 and an increase in BET area (from 1 m 2 g À1 to 17 m 2 g À1). Moreover, temperature programmed desorption measurements have revealed a significant hydrogen uptake (0.71 mmol m À2 ) on b-Mo 2 N. This has been exploited in the hydrogenation of p-chloronitrobenzene where p-chloroaniline was generated as the sole product with an associated rate constant (k = 2.0 min À1) that is higher than values recorded for supported transition metals. Our study establishes the reaction mechanism involved in the synthesis of b-Mo 2 N and demonstrates its viability to promote selective -NO 2 group reduction as an alternative sustainable, high throughput route to commercially important haloamines.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

β-Molybdenum nitride: synthesis mechanism and catalytic response in the gas phase hydrogenation of p-chloronitrobenzene

Cárdenas‐Lizana

Gómez‐Quero

Perret

et al. 2011

Catal. Sci. Technol.

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“…The transition metal nitrides can be prepared as thin films or coatings by several techniques such as: (i) chemical vapour deposition (CVD) [1,2], (ii) physical vapour deposition (PVD) [3], (iii) arc-physical vacuum deposition [4], (iv) microwave plasma [5], (v) magnetron sputtering [6][7][8][9], (vi) multipulse laser irradiation [10,11] and, (vii) ion implantation [12].…”

Section: Introductionmentioning

confidence: 99%

“…Anitha et al discussed the possible use of c-Mo 2 N thin film as a diffusion barrier layer in Si-based microelectronic devices to prevent the interdiffusion or reaction of the contact metal with the substrate silicon, and as a hard coating material (on machining tools and turbine blades) [7,8,22].…”

Section: Introductionmentioning

confidence: 99%

The wet corrosion of Mo and Mo-Ti alloy thin film - Part IV: The effect of nitriding

Tomachuk

Mitton

Špringer

et al. 2006

Materials and Corrosion

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A considerable number of detailed investigations have been carried out on the deposition and characterisation of molybdenum and molybdenum-titanium-nitride films by employing a variety of techniques. However, very little is currently known about the effect of composition (N 2 /Ar flow rate) on the corrosion properties of MoN and MoTiN thin films for aggressive ambient conditions. In this work, the electrochemical and corrosion behaviour of MoN and MoTiN thin films, produced by Physical Vapour Deposition (PVD) with different N 2 /Ar flow rates, has been investigated by Electrochemical Impedance Spectroscopy (EIS) in aerated alkaline chloride solution and compared with the behaviour of pure molybdenum in the same environment. Results obtained indicate that increasing nitrogen content in the film leads to a beneficial effect on the corrosion resistance, but results in decreased electrical conductivity of the film that may limit their application as back contact in photovoltaic modules.

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“…Due to their mechanical stability Mo-N coatings make a good candidate for wear resistant coatings in tribological applications [6]. Mo-N thin films were also considered for wear protective coatings [7] and as diffusion barriers for aluminum in ultra-large-scale integrated circuits (ULSI) [8]. Various techniques are used to deposit Mo-N coatings [9], vacuum-arc evaporation [10], plasma-enhanced chemical vapor deposition (PECVD) [11], cathodic arc PVD [6] and nitride layers by ion implantation [12].…”

Section: Introductionmentioning

confidence: 99%

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

Bouaouina

Besnard

Abaidia

et al. 2018

Surface and Coatings Technology

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is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. A B S T R A C TMolybdenum nitride thin films were deposited on (100) silicon substrates by R.F. magnetron sputtering of a Mo target in a (Ar-N 2 ) gas mixtures. The films were studied by Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS) and X-ray diffraction. The nanomechanical properties have been determined by nanoindentation and Peak-Force Quantitative Nanomechanical Mapping (PF-QNM). The total internal stresses were determined by curvature measurements and the Stoney formula. As thin film composition influences the morphology, the stress state and the mechanical properties, modifications are expected in this study where the nitrogen content is tuned. The film exhibits a polycrystalline structure with preferred orientation along (111) plane. The increase of the nitrogen content in the coating (N/ Mo = 1.1) induces a broadening of the full width at half maximum (FWHM) of the (111) diffraction peak, which is attributed to the presence of smaller crystallites. The residual stress and mechanical properties variation were correlated to the structural transition from γ-Mo 2 N to hexagonal and cubic MoN. The results show a good agreement between the nanomechanical properties obtained by nanoindentation and PF-QNM.

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Study of sputtered molybdenum nitride as a diffusion barrier

Cited by 51 publications

References 20 publications

β-Molybdenum nitride: synthesis mechanism and catalytic response in the gas phase hydrogenation of p-chloronitrobenzene

β-Molybdenum nitride: synthesis mechanism and catalytic response in the gas phase hydrogenation of p-chloronitrobenzene

The wet corrosion of Mo and Mo-Ti alloy thin film - Part IV: The effect of nitriding

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

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