2006
DOI: 10.1016/j.microrel.2005.07.107
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Study of RF N− LDMOS critical electrical parameter drifts after a thermal and electrical ageing in pulsed RF

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Cited by 15 publications
(13 citation statements)
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References 11 publications
(17 reference statements)
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“…The test bench [11] is based on a central unit that can test several devices simultaneously. It consists in a computer driving control and data-recording peripherals (power supplies, triggers, memories).…”
Section: Test Bench and Protocol Descriptionmentioning
confidence: 99%
“…The test bench [11] is based on a central unit that can test several devices simultaneously. It consists in a computer driving control and data-recording peripherals (power supplies, triggers, memories).…”
Section: Test Bench and Protocol Descriptionmentioning
confidence: 99%
“…The test bench [5] is based on a central unit which can test several devices simultaneously. It consists in a computer driving control and data-recording peripherals (power supplies, triggers, memories).…”
Section: B Test Bench and Protocol Descriptionmentioning
confidence: 99%
“…In other words, the drain-source voltage increases the electric field below the gate towards the trench LDD region and near the oxide layer, therefore enhancing the trapping process. So the degradation rate is accelerated [15,19,20]. This means that the tracking of these parameters enables to consider the hot carrier injection as dominant degradation phenomenon in spite of the power efficiency improvement.…”
Section: Testmentioning
confidence: 99%