Study of plasma dynamics in a modulated pulsed power magnetron discharge using a time-resolved Langmuir probe

Li, Meng; Cloud, A.N.; Jung, Sungmoon; Ruzic, D. N.

doi:10.1116/1.3528940

Cited by 34 publications

(20 citation statements)

References 27 publications

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“…, 154 which is lower than is observed for the shorter and more intense HiPIMS pulses as discussed earlier. In summary, it is seen that the HiPIMS discharge generates a dense plasma both in metal as well as reactive mode with peak densities reaching up to 10 19 m…”

Section: à3mentioning

confidence: 48%

High power impulse magnetron sputtering discharge

Guðmundsson¹,

Brenning²,

Lundin³

et al. 2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

625

446

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The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron target in unipolar pulses at low duty cycle and low repetition frequency while keeping the average power about 2 orders of magnitude lower than the peak power. This results in a high plasma density, and high ionization fraction of the sputtered vapor, which allows better control of the film growth by controlling the energy and direction of the deposition species. This is a significant advantage over conventional dc magnetron sputtering where the sputtered vapor consists mainly of neutral species. The HiPIMS discharge is now an established ionized physical vapor deposition technique, which is easily scalable and has been successfully introduced into various industrial applications. The authors give an overview of the development of the HiPIMS discharge, and the underlying mechanisms that dictate the discharge properties. First, an introduction to the magnetron sputtering discharge and its various configurations and modifications is given. Then the development and properties of the high power pulsed power supply are discussed, followed by an overview of the measured plasma parameters in the HiPIMS discharge, the electron energy and density, the ion energy, ion flux and plasma composition, and a discussion on the deposition rate. Finally, some of the models that have been developed to gain understanding of the discharge processes are reviewed, including the phenomenological material pathway model, and the ionization region model.

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Section: à3mentioning

confidence: 48%

High power impulse magnetron sputtering discharge

Guðmundsson¹,

Brenning²,

Lundin³

et al. 2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

625

446

View full text Add to dashboard Cite

show abstract

“…Such concept was realized in the Modulated Pulsed Power (MPP) sputtering system by the company ZPulser [177], characterized e.g. by Meng and coworkers [178]. Lin and coworkers combined this with dc sputtering to form CrSiN coatings [179].…”

Section: Burst Of Pulses and Other Extensionsmentioning

confidence: 99%

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Anders

2014

Surface and Coatings Technology

232

109

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High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

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“…to avoid damaging the magnetron, which means that the peak plasma density is limited to around 10 17 -10 18 m -3 , 77 and the degree of metal ionization is found to be lower compared to shorter HiPIMS pulses. 78 Still, the perspective of using multiple pulse packets within the same MPP pulse may result in facilitating the ignition of the plasma.…”

Section: E Pulse Configurationmentioning

confidence: 99%

An introduction to thin film processing using high-power impulse magnetron sputtering

2012

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High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized physical vapor deposition technique and is already making its way to industrial applications. The major difference between HiPIMS and conventional magnetron sputtering processes is the mode of operation. In HiPIMS the power is applied to the magnetron (target) in unipolar pulses at a low duty factor (andlt;10%) and low frequency (andlt;10 kHz) leading to peak target power densities of the order of several kilowatts per square centimeter while keeping the average target power density low enough to avoid magnetron overheating and target melting. These conditions result in the generation of a highly dense plasma discharge, where a large fraction of the sputtered material is ionized and thereby providing new and added means for the synthesis of tailor-made thin films. In this review, the features distinguishing HiPIMS from other deposition methods will be addressed in detail along with how they influence the deposition conditions, such as the plasma parameters and the sputtered material, as well as the resulting thin film properties, such as microstructure, phase formation, and chemical composition. General trends will be established in conjunction to industrially relevant material systems to present this emerging technology to the interested reader.Funding Agencies|Swedish Research Council (VR)|623-2009-7348

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Study of plasma dynamics in a modulated pulsed power magnetron discharge using a time-resolved Langmuir probe

Cited by 34 publications

References 27 publications

High power impulse magnetron sputtering discharge

High power impulse magnetron sputtering discharge

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

An introduction to thin film processing using high-power impulse magnetron sputtering

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