Study of plasma characteristic and properties of flexible ultra-thin ITO films prepared by large area 3-D confined and planar magnetron sputtering

Sahu, Bibhuti Bhusan; Wen, Long; Kim, Seok H.; Han, Jeon G.

doi:10.1016/j.vacuum.2019.04.029

Cited by 13 publications

(13 citation statements)

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“…The magnetron sputtering (MS) method, a plasma-based technique, has been extensively used for the deposition of a wide variety of thin films. [1][2][3] Particularly, transparent conductive oxide (TCO) 4 films like tin-doped indium oxide (ITO), Al or Ga-doped zinc oxides (AZO or GZO), F-doped SnO 2 (FTO), and zinc oxide (ZnO) have been recognized as materials with excellent optical and electrical properties for many such applications. Among these films, ITO films have been shown to produce very low resistivity or high conductivity along with a very high optical transmittance even at relatively lower film thickness.…”

Section: Introductionmentioning

confidence: 99%

“…Among these films, ITO films have been shown to produce very low resistivity or high conductivity along with a very high optical transmittance even at relatively lower film thickness. 3 With increasing demands in display devices and flat panel technologies, the deposition of thin films on flexible substrates (regarded as flexible films) has attracted significant attention in these fields. [1][2][3] The plasma-assisted MS process has become a good choice to develop flexible ITO films for industry applications.…”

Section: Introductionmentioning

confidence: 99%

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Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films

Nisha,

Sahu

2024

AIP Advances

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This work reports a systematic review of the studies of magnetron sputtering (MS) discharges and their utilities for the deposition of transparent coating oxide thin films like indium tin oxides (ITOs). It collates the overall information of plasma science, diagnostics, and chemistry and their usefulness in controlling the plasma process, film growth, and properties. It discusses studies on various MS systems and their capabilities and reports scientific aspects like the formation of instability and plasma flares to understand the various discharge phenomena. The study also discusses various issues, progress, and challenges in ITO films for industrial applications. In addition, this work highlights the importance of plasma parameters and energy flux on thin film growth and film properties.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films

Nisha,

Sahu

2024

AIP Advances

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“…Moreover, thermal and electric stability of films are the commonly required parameters as well. In order to control the basic properties of ITO, various technological steps are used, such as switching the parameters during the deposition, thermal treatment, structurization with nanoparticles and laser processing [14][15] [16].…”

Section: Introductionmentioning

confidence: 99%

Laser-vacuum deposited ITO thin films for optoelectronic applications

Toikka¹,

Каманина²

2021

Technium

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In the current paper, it has been considered the relief features and electric properties of the transparent contacts based on the indium tin oxides. During the formation of samples, the laser oriented deposition method using the CO2 laser operated at the wavelength of 10.6 μm and with the power of 30 W has been used. The deposition process has been revealed via varied the intensity of external electric field in the range of 100-600 V/cm. The influence of the electric field on the deposition process and its correlation with the relief features and electric properties have been evaluated.

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“…Furthermore, ITO thin films can be prepared using different methods, while the most often used are magnetron sputtering (Hadi Ali et al, 2018;Voisin et al, 2018;Heo et al, 2015), electron beam evaporation (Diniz, 2011), thermal evaporation (Ozkartal, 2019) and pulsed laser deposition (Tan et al, 2013). It is worth to mention that the magnetron sputtering conditions can significantly influence the electrical and optical properties of ITO thin films (Sousa and da Cunha, 2019;Seong et al, 2018;Sahu et al, 2019). Among others, the thermal energy released during the sputtering process may directly improve the electrical and optical properties of ITO films.…”

Section: Introductionmentioning

confidence: 99%

Effect of thickness on optoelectronic properties of ITO thin films

Mazur

Pastuszek

Wojcieszak

et al. 2020

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Purpose Indium tin oxide (ITO) is a material belonging to the group of transparent conductive oxides, which are widely used in many fields of technology including optoelectronics and photovoltaics. However, the properties of ITO thin films depend on many factors. Therefore, the aim of the study was thorough investigation of the properties of sputtered ITO thin films of various thicknesses. Design/methodology/approach ITO coatings were deposited by magnetron sputtering in pure argon atmosphere using ceramic ITO target. Various deposition times resulted in obtaining thin films with different thickness, which had significant influence on the optoelectronic properties of deposited coatings. In this work the results of investigation of structural, surface, optical and electrical properties were presented. Findings Increase of the coating thickness caused change of the microstructure from amorphous to nanocrystalline and occurrence of grains with a size of 40 to 60 nm on their surface. Moreover, the fundamental absorption edge was red-shifted, whereas the average transmission in the visible wavelength range remained similar. Increase of the thickness caused considerable decrease of the sheet resistance and resistivity. It was found that even thin films with a thickness of 10 nm had antistatic properties. Originality/value The novelty and originality of presented work consists in, among other, determination of antistatic properties of ITO thin films with various sheet resistances that are in the range typical for dielectric and semiconducting material. To date, there are no reports on such investigations in the literature. Reported findings might be very helpful in the case of, for example, construction of transparent antireflective and antistatic multilayers.

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Study of plasma characteristic and properties of flexible ultra-thin ITO films prepared by large area 3-D confined and planar magnetron sputtering

Cited by 13 publications

References 31 publications

Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films

Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films

Laser-vacuum deposited ITO thin films for optoelectronic applications

Effect of thickness on optoelectronic properties of ITO thin films

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