2012
DOI: 10.1364/oe.20.002942
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Study of moiré grating fabrication on metal samples using nanoimprint lithography

Abstract: A moiré grating is a basic optical component used in various moiré methods for deformation measurement. In this study, nanoimprint lithography (NIL) was proposed to produce high frequency moiré gratings on metal samples. A new type of NIL mold and a hot embossing system were developed to overcome the poor flatness and roughness of metal samples. This three-layer mold based on nickel grating was unbreakable, and the self-developed hot embossing system used a bellows cylinder to satisfy the parallelism requireme… Show more

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Cited by 35 publications
(19 citation statements)
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“…At a higher scale, pitches of some tenths of μ m to some μ m can be obtained by various techniques such as nanoimprint lithography . With the so‐called electron beam moiré technique, the lines of the reference grid are ‘drawn’ on the substrate by using the electron beam of a scanning electron microscope (SEM) , or milled using a focused ion beam .…”
Section: Marking Surfaces With Gridsmentioning
confidence: 99%
“…At a higher scale, pitches of some tenths of μ m to some μ m can be obtained by various techniques such as nanoimprint lithography . With the so‐called electron beam moiré technique, the lines of the reference grid are ‘drawn’ on the substrate by using the electron beam of a scanning electron microscope (SEM) , or milled using a focused ion beam .…”
Section: Marking Surfaces With Gridsmentioning
confidence: 99%
“…Recently, combining with the advanced fabrication techniques of high-frequency gratings [8][9][10], GPA has been widely used in the deformation measurement at micro-and nano-scale [11][12][13][14][15][16][17]. The traditional GPA method, referred to as FT-GPA in this paper, is based on the relationship between the displacement and the phase difference.…”
Section: Introductionmentioning
confidence: 99%
“…There are several approaches to fabricate highfrequency gratings on a specimen, including holographic photolithography [9], electron beam lithography (EBL) [10], focused ion beam (FIB) lithography [11], and nanoimprint lithography (NIL) [12]. However, these methods all involve certain drawbacks, which limit their applications in optical methods.…”
Section: Introductionmentioning
confidence: 99%