Study of manganese oxide thin films grown by pulsed laser deposition

Isber, S.; Majdalani, Elisar; Tabbal, M.; Christidis, T.; Zahraman, K.; Nsouli, B.

doi:10.1016/j.tsf.2008.09.097

Cited by 36 publications

(30 citation statements)

References 19 publications

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“…In the region from 500 to 400 cm À1 , the absorption peak observed at 420.80 and 451.34 cm À1 may be originating from the Mn atoms in the films and attributed to the band stretching modes of the octahedral sites [21]. The peak observed at 736.81 cm À1 may be attributed to the O atoms in the MnO layers [22]. The peak at 817.82 and 852.54 cm À1 may be due to overtone modes of bulk MneO stretching's of Mn 3 O 4 [23].…”

Section: Ftir Studymentioning

confidence: 96%

Characterization of nanostructured Mn3O4 thin films grown by SILAR method at room temperature

Ubale¹,

Belkhedkar²,

Sakhare³

et al. 2012

Materials Chemistry and Physics

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Section: Ftir Studymentioning

confidence: 96%

Characterization of nanostructured Mn3O4 thin films grown by SILAR method at room temperature

Ubale¹,

Belkhedkar²,

Sakhare³

et al. 2012

Materials Chemistry and Physics

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“…However, this method applies high-energy pulses which may cause undesirable defects in the structure, and thereby change the electronic behavior of the films. PLD has been used to deposit various binary compounds [32][33][34][35][36][37][38][39][40][41][42][43][44][45][46][47].…”

Section: Introductionmentioning

confidence: 99%

Pulsed Laser Deposition of Rocksalt Magnetic Binary Oxides

et al. 2019

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Magnetic binary oxides with the rocksalt structure constitute an important class of materials for potential applications as electronic or electrochemical devices. Moreover, they often become a theoretical playground, due to the simple electronic and crystal structures, in the quest for novel phenomena. For these possibilities to be realized, a necessary prerequisite would be to grow atomically ordered and controllably-strained binary oxides on proper substrates. Here we systematically explore the use of pulsed laser deposition technique (PLD) to grow three basic oxides that have rocksalt structure but different chemical stability in the ambient atmosphere: NiO (stable), MnO (metastable) and EuO (unstable). By tuning laser fluence FL, an epitaxial single-phase NiO thin-film growth can be achieved in a wide range of growth temperatures 10 ≤ TG ≤ 750 °C. At the lowest TG, the out-of-plane strain raises to 1.5%, which is five times higher than in NiO film grown at 750 °C. MnO thin films that had long-range order were successfully deposited on the MgO substrates after appropriate tuning of deposition parameters. The growth of MnO phase was strongly influenced by FL and the TG. EuO films with satisfactory quality were deposited by PLD after oxygen availability had been minimized. Synthesis of EuO thin films at rather low TG = 350 °C prevented thermally-driven lattice relaxation and allowed growth of strained films. Overall, PLD was a quick and reliable method to grow binary oxides with rocksalt structure in high quality that can satisfy requirements for applications and for basic research.Thin-film deposition is a technique that can be used to control strain in materials [22]. The Curie temperature TC of EuO thin film is strongly dependent on the strain and on film thickness tF [23]. Dislocations in NiO thin films locally change the magnetic ordering from antiferromagnetic to ferromagnetic [24]. Such 'ferromagnetic' dislocations originate from a local non-stoichiometry at in dislocation cores where Ni is deficient. A slight deviation from the stoichiometry also changes the conduction behavior in NiO thin films. Oxygendeficient EuO shows metallic behavior with a substantial increase of the TC to 120 K [25]. The deposition of high-quality magnetic binary oxides, and the ability to control the level of strain and density of defects in their structure, are challenging tasks in materials science and solid-state physics.Pulsed-laser deposition technique (PLD) has many advantages for growing thin films of high-quality oxides [26][27][28][29][30][31]. PLD can preserve the stoichiometry of the film composition,

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“…In this context manganese oxides are the most promising materials due to its low cost, environment friendly in nature and excellent performance [20][21][22]. Manganese oxide films have been prepared by different methods including sol-gel method [23][24][25][26][27][28][29], electrochemical deposition method [30][31][32], and physical vapor deposition method [33][34][35] etc. The values of specific capacitance of manganese oxide film are reported as 240 F g À1 [30], 243.2 F g À1 [32], 328 F g À1 [25], etc.…”

Section: Introductionmentioning

confidence: 99%