Study of heating effect on CAR in electron beam mask writing

Kamikubo, Takashi; Hiramoto, Makoto; Yashima, J.; Takahashi, Mutsuo; Nishimura, Rieko; Katsumata, Takehiko; Anze, Hirohito; Sunaoshi, Hitoshi; Tamamushi, Shuichi; Ogasawara, Masataka

doi:10.1117/12.728986

Cited by 6 publications

(5 citation statements)

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“…The performances of EB mask writers have been improved to meet the market demands. Among the performances, the current density of the EB has been increased from 70 A cm −2 (NuFlare EBM-6000) 1) to 400 A cm −2 (NuFlare EBM-8000), 2) 800 A cm −2 (NuFlare EBM-9000) 2) and 1200 A cm −2 (NuFlare EBM-9500) 3) to meet the requirement for the throughput of mask fabrication. Such high current density increases the temperature of resists and substrates.…”

Section: Introductionmentioning

confidence: 99%

“…This resist pattern deformation is called a resist heating effect. 1,[3][4][5][6][7][8][9][10][11][12][13][14][15][16] The temperature rise has been experimentally and theoretically investigated. The resist deformation caused by the temperature rise has also been experimentally and theoretically investigated.…”

Section: Introductionmentioning

confidence: 99%

“…Using EBM-6000, dCD/dT of 180 nm half-pitch line-and-space patterns was evaluated to be approximately 0.1 nm K −1 for four kinds of resists when the acceleration voltage and current density were 50 kV and 70 A cm −2 , respectively. 1) Exposure methods for avoiding the resist heating effect have been proposed. 3) However, a better understanding of resist heating is required to meet the increasing demand for the strict control of fidelity in the mask and mold fabrication.…”

Section: Introductionmentioning

confidence: 99%

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Theoretical study on effects of electron thermal energy on sensitization process of chemically amplified electron beam resists—contribution to resist heating effect in electron beam mask writing

Kozawa

Tamura²

2019

Jpn. J. Appl. Phys.

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The elevation of resist temperature during exposure to electron beam (EB) deforms the patterns of chemically amplified resists. The resist heating effect is a significant problem in mask production using a high-current EB mask writer. However, its mechanism is still unknown. In this study, the effects of electron thermal energy on the sensitization process of chemically amplified EB resists were investigated using simulation on the basis of their sensitization mechanism. The decomposition yield of sensitizers increased with resist temperature. The effect of the increase of decomposition yield on the critical dimension (CD) was calculated on the basis of the reaction mechanism. When the exposure pattern width was set to the same as the half-pitch (16 nm), the values of dCD/dT were 0.019, 0.013 and 0.010 nm K−1 for the sensitizer concentrations of 0.2, 0.3 and 0.4 (molecules) nm−3, respectively. dCD/dT was decreased by decreasing the exposure pattern width.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Theoretical study on effects of electron thermal energy on sensitization process of chemically amplified electron beam resists—contribution to resist heating effect in electron beam mask writing

Kozawa

Tamura²

2019

Jpn. J. Appl. Phys.

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“…3,5,[16][17][18] Recently, the heating effect has been attracting attention, especially in relation to critical dimension deviation in mask manufacturing. [19][20][21][22][23][24] The inhomogeneous temperature increase in the resist on the mask substrate disturbs precise pattern transfer. However, the physical and/ or chemical mechanisms that induce the heating effect on the resist sensitivity are still unknown.…”

Section: Introductionmentioning

confidence: 99%

“…18) CAR has been used for the EB lithography mask fabrication method because of its excellent properties such as high sensitivity and resolution. 12,13,20,[25][26][27] CAR is commonly composed of a resist matrix (mainly polymers), a photoacid generator (PAG), and some additives such as a photo-decomposable quencher. The typical CAR resist matrix consists of protected (nonpolar) and non-protected (polar) units.…”

Section: Introductionmentioning

confidence: 99%

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

Ikari¹,

Okamoto²,

Konda³

et al. 2020

Jpn. J. Appl. Phys.

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The photomask used in the lithography process has the important role of transferring circuit pattern images onto the photoresist. To meet the demand for increased photomask manufacturing throughput, the current density of electron beam (EB) writers has been increased. EB exposure locally increases the resist temperature on the mask substrate depending on various factors, including current density, shot size, and writing order. Resist sensitivity increases with irradiated resist temperature, a phenomenon known as “heating effect”. In this study, we reported the cause of the temperature-dependent sensitivity increase in a polyhydroxystyrene-type chemically amplified resist. The experimental results, including acid generation efficiency measurements and pulse radiolysis with changing temperature, suggest that the heating effect is mainly caused by the deprotonation efficiency associated with the radical cation of the base polymer.

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Thermal analysis with high accuracy of multi-beam mask fabrication

Zhang,

Dong,

Liu

et al. 2024

Journal of Vacuum Science &Amp; Technology B

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For a 7 nm technology node and beyond, multi-beam mask fabrication based on charged particles has attracted attention widely and shows great advantages in terms of throughput. However, the heating effect during mask writing is a serious problem and makes deformation error. To address this issue, an accurate analysis of heating with multi-beam writing is necessary. In this study, the thermal effects of electron beams on a mask during writing time (exposure time and nonexposure time) were simulated with a finite element numerical method. The variation in the temperature field with two writing paths (S-shaped and E-shaped) was analyzed. A comparative analysis of the mask’s deformation under different writing paths was conducted. Numerical research shows that the thermal analysis method in this study provides a guide for optimizing the process parameters of mask fabrication.

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Study of heating effect on CAR in electron beam mask writing

Cited by 6 publications

References 0 publications

Theoretical study on effects of electron thermal energy on sensitization process of chemically amplified electron beam resists—contribution to resist heating effect in electron beam mask writing

Theoretical study on effects of electron thermal energy on sensitization process of chemically amplified electron beam resists—contribution to resist heating effect in electron beam mask writing

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

Thermal analysis with high accuracy of multi-beam mask fabrication

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