Study of chalcogenide-glass-based reflecting optical marks

Muravsky, Leonid I.; Kostyukevych, S. O.; Voronyak, Taras I.; Shepeliavyi, P. E.

doi:10.1117/12.524108

Cited by 6 publications

(17 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…8 The main advantage consists in removal of the phase and speckle noise caused by any microdeformation of a film layer and its optically rough surface. This noise does not allow reconstructing the correlation response from ROM's replicas written on a flexible substrate.…”

Section: Discussionmentioning

confidence: 99%

“…3. Calculations of the optimum exposure represented in our previous paper 8 have shown that one is disposed on the dip of curve η=η(E) after reaching its peak value, if 0.1 ≤ ρ A ≤ 0.4 and w A ≤ 0.66. So, we chose the exposures in the range from 100 mJ/cm 2 up to 200 mJ/cm 2 and the normalized radius ρ A = 0.1 disposed on the normalized distance w A = 0.5 from the frequency plane (u,v) origin.…”

Section: Measurement Of Diffraction Efficiency Of a Chalcogenide Glasmentioning

confidence: 92%

“…As shown in our previous paper 8 , procedures of a reflecting optical mark fabrication and its identification can be realized on the basis of a JTC architecture. The first stage of this correlator was used to produce a reflecting optical mark written on a solid substrate, for example, on a chalcogenide glass As 40 S 40 Se 20 layer.…”

Section: Conditions Of Master Hologram Recording and Reconstructionmentioning

confidence: 99%

“…8,10 This approach is based on fulfillment of two basic conditions: i) definition of the diffraction efficiency η versus exposure experimental dependence (exposure characteristic) for a photosensitive medium or a SLM; ii) mathematical representation of the interference pattern, which should be written on a photosensitive medium or a SLM. If the exposure characteristic and the function describing or approximating the written interference pattern are known, one can find the optimum writing exposure E E opt , the reading round aperture's A r normalized radius …”

Section: Nonlinear Modelmentioning

confidence: 99%

“…One of possible solutions of this problem is the creation of a reflecting optical mark by recording a joint power spectrum (JPS) of a transformed and reference phase masks on a chalcogenide glass As 40 S 40 Se 20 at the first stage of a joint transform correlator (JTC) scheme. 8 The resulting reflecting optical mark is fabricated as a copy of the written JPS. However, reflecting optical marks can be copied only on a solid substrate.…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

The new approach to identification of film reflecting holographic marks

Kostyukevych¹

2011

Semicond. Phys. Quantum Electron. Optoelectron.

View full text Add to dashboard Cite

Abstract. The new approach for creation of film reflecting holographic marks for optical security is proposed. Such marks are replicas of a reflecting master hologram recorded on a chalcogenide glass layer. To receive the master hologram, the joint power spectrum of a reference phase mask and an input phase mask or a transformed phase mask is produced at the plane of the hologram writing and is modulated by an inclined laser beam. If an inclined laser beam illuminates the replica recorded on a flexible substrate, phase noise including speckle noise is eliminated because the hologram carrier frequency exceeds greatly the limiting frequency of the phase noise power spectrum. Experimental results have shown the principal possibility to produce the high performance film reflecting holographic marks for security applications. The proposed approach can be combined with technologies for fabrication of rainbow holograms. In this case, the received rainbow holograms are the reflecting holographic marks simultaneously. Therefore, they can be verified not only visually, but also by means of automatic identification.

show abstract

Section: Discussionmentioning

confidence: 99%

Section: Measurement Of Diffraction Efficiency Of a Chalcogenide Glasmentioning

confidence: 92%

Section: Conditions Of Master Hologram Recording and Reconstructionmentioning

confidence: 99%

Section: Nonlinear Modelmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

The new approach to identification of film reflecting holographic marks

Kostyukevych¹

2011

Semicond. Phys. Quantum Electron. Optoelectron.

View full text Add to dashboard Cite

show abstract

P‐125: Optimisation of the Mechanical Stability and Rewriting Speed of Optically Rwritable e‐Paper

Sun

Srivastava

Chigrinov

et al. 2014

Symp Digest of Tech Papers

View full text Add to dashboard Cite

Process optimization for increasing the response speed of liquid crystal optical rewritable e-paper was investigated. It is demonstrated that by filling LC in atmosphere condition rewriting time could be decreased to 6 seconds with good repeatability. Increasing the spin coating speed and time could also decrease the azimuthal anchoring energy, but it will cause non-continuous film form of alignment layer which causes large speed dispersion that is not good for practical use. Serial experiments show that with smaller azimuthal anchoring energy the rewriting time could be smaller. The results demonstrate that with proper fabrication process of alignment layer for liquid crystal optical rewritable e-paper, azimuthal anchoring energy could be adjusted to an optimal value which is beneficial for achieving fastest rewriting speed and at the same time strong enough to well align LC. Keywords: optical rewritable; anchoring energy; rewriting speed; azo-dye; Oral/Poster Preference: Either oral or poster presentation; Symposium Topic: Liquid Crystal Technology; Background and ObjectivesE-paper is one type of display device designed to mimic the ordinary paper, which requires ultra low or zero power consumption. It should use no backlight and is capable of holding text and images without applying any electricity, while allows the image to be changed later. High level complexity of driving electronics often causes problems of insufficient durability of flexible conductor and contact bonding to the epaper application of nematic liquid crystal (NLC) [1][2][3][4][5][6][7][8][9][10][11]. We developed an optically rewritable (ORW) display [12][13][14][15][16][17][18][19][20][21] by separating e-paper display unit from driving electronics, significantly reducing the complexity of the ORW e-paper structure. This separation makes the ORW e-paper much more durable and cheaper and ready for the flexible challenge. By using ORW technique, text or images of LC e-paper can be obtained in a one-mask step exposure process. First, uniform alignment over the entire substrate surface is created. Then, exposure process was done again using one mask with text or image information shadowed in desired regions, and finally the alignment in the non-shadowed area is simply rewritten to desired orientation. The process is fully compatible with standard photolithography exposure equipped with adjustable polarizer. ORW technology is still limited to laboratory application field mainly due to long rewriting time. Previous paper shows that the operational time of the ORW e-paper using E7 LC was about 11 seconds exposed by 125 mW/cm 2 polarized light from a highpressure Hg lamp filtered with a peak at 450 nm [15]. We have investigated the effect of LC type on the rewriting speed of ORW e-paper and demonstrated that the rewriting speed can be increased by selecting 5CB LC [22]. However, phase transformation point for 5CB from nematic to isotropic state is as low as 35°C, which makes it impossible to be used in hot environment.In this study, we inve...

show abstract