Study and Fabricate of TV Goniometry Optics Composite Film

Xiuhua, 付秀华 Fu; Shi-fu, 熊仕富 XIONG; Dongmei, 刘冬梅 Liu; Jing, 张 静 Zhang; Yong-gang, 潘永刚 PAN

doi:10.3788/gzxb20154411.1131003

Cited by 3 publications

(3 citation statements)

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“…Through the beat of ion beam to the substrate by the gas particles, deposition particles can obtain larger kinetic energy, increase the mobility ratio of material particles, strengthen the adhesion force between layer and substrate, layers and layers, reduce the inner stress [7]. Kauffman ion source has the advantages of low beam and high energy.…”

Section: The Parameters Of Ion Sourcementioning

confidence: 99%

Study and Fabricate of Reflectance Coating for UV Lithography Machine Arc Lampshade

Fu¹,

Xiong²,

Liu³

et al. 2017

dteees

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Abstract. As one of the key components in lithography, the UV light source has very high demands for wavelength of source and energy. To meet the requirements of UV light source, it demands UV reflectance coating prepared on Φ78mm Mg-Al alloy paraboloid lampshade . Based on design theory of film, H4 and SiO 2 were selected as high and low refractive index materials respectively, and with the help of TFCalc, adopting electron beam vacuum coating method, the reflectance coating was prepared, which satisfied the requirements of reflectivity greater than 98.5% within band of 365-436nm in the case of 0 o -45 o incident angles. First the reflective band width was broadened through the coating stack; then according to the thickness distribution of film, compensation baffle was designed and modified, which ensured the uniformity of reflectance coating in the lampshade. And last, firmness of coating was strengthened and the reflectivity in the required band was improved by depositing one bonding layer of metal between Mg-Al alloy and dielectric film. By repeated trials, coating absorption problem was solved by changing the process parameters and coating quality of film was improved with the use of ion source assisted deposition, finally the UV film meets the requirements for use.

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Section: The Parameters Of Ion Sourcementioning

confidence: 99%

Study and Fabricate of Reflectance Coating for UV Lithography Machine Arc Lampshade

Fu¹,

Xiong²,

Liu³

et al. 2017

dteees

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“…YF 3 has greater internal stress than YbF 3 in the case of the same thickness, which makes film more likely to crack and strip. YbF 3 has more advantages than YF 3 on solving the firmness of film, and stress matching of ZnS and YbF 3 is better [3] , so YbF 3 is selected as the low refractive index material.…”

Section: Substrate and Materials Choicementioning

confidence: 99%

Study and Fabrication of Multi-Band Filter Film on ZnS Substrate

Zhang

Sun

et al. 2013

KEM

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In order to satisfy the special requirements of IR optical instrument, multi-band filter film on the substrate of ZnS is deposited by adopting electron beam vacuum depositing method with the ion assistant deposition technology. At incident angle of 0°～25°, 660nm high reflection and 1064nm and 3～5μm high transmission are realized. ZnS and YbF3 are selected as the high and low refractive index materials, and the film structure prepared easily is getting by optimizing the film system design curve ceaselessly. The precision of thickness control has been improved by adjusting film process parameters and improving film thickness control methods. The adhesion and firmness of film and substrate has been increased by pre-coating and mixed evaporation technology, and the laser induced damage threshold of film has been improved with vacuum annealing. The deposited film can endure the environmental tests such as rain pour, salt fog, and high and low temperature etc, and meet its practical requirement.

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“…In 2013, Xiaodan Gao completed the design of variable-angle 3~5 μm IR depolarization and transmission enhancement film, and the incidence of angle with 45° light-splitting film from 1260 nm to 1360 nm spectral range was designed by resolution, needle, and variable metric optimization methods using the initial formula designed by TFCalc formula design software [ 8 , 9 ]. In 2015, Xiuhua Fu et al used a combined metal-dielectric structure to design a 500~900 nm spectrophotometric film to solve the polarization separation problem arising from the tilted incidence of a broad-spectrum beam [ 10 ]. In 2016, Qiuhui Zhuang et al designed and developed a depolarization spectrophotometer with an operating band of 0.35~1.7 μm, and the optical efficiencies of the reflection and transmission band reached 97% and 91%, respectively, with the polarization sensitivity of the reflection band controlled within 1.5% [ 11 ].…”

Section: Introductionmentioning

confidence: 99%

Development of Wide-Angle Depolarizing Reflector at 1064 nm

Han

Jiang

Guo³

et al. 2023

Materials

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Optical coherence tomography is a new promising chromatographic imaging technique with the advantages of noncontact and high resolution without damage, which is widely used in the field of biological tissue detection and imaging. As an important optical element in the system, the wide-angle depolarizing reflector plays a key role in the accurate acquisition of optical signals. Ta2O5 and SiO2 are selected as the coating materials for the technical parameter requirements of the reflector in the system. Based on the basic theory of optical thin film and combined with MATLAB and OptiLayer software, the design of 0~60° incident 1064 ± 40 nm depolarizing reflective film is realized by establishing the evaluation function of the film system. To optimize the oxygen-charging distribution scheme during film deposition, the weak absorption properties of the film materials are characterized by optical thermal co-circuit interferometry. According to the sensitivity distribution of the film layer, the optical control monitoring scheme with a thickness error of less than 1% is designed rationally. “Crystal control + optical control” is used to precisely control the thickness of each film layer and complete the preparation of resonant cavity film. The measurement results show that the average reflectance is more than 99.5%, and the deviation of P-light and S-light is less than 1% in the 1064 ± 40 nm wavelength band range from 0° to 60°, which meets the requirements of optical coherence tomography system.

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Study and Fabricate of TV Goniometry Optics Composite Film

Cited by 3 publications

References 0 publications

Study and Fabricate of Reflectance Coating for UV Lithography Machine Arc Lampshade

Study and Fabricate of Reflectance Coating for UV Lithography Machine Arc Lampshade

Study and Fabrication of Multi-Band Filter Film on ZnS Substrate

Development of Wide-Angle Depolarizing Reflector at 1064 nm

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