Studies on photosensitive homopolymer and copolymers having a pendant photocrosslinkable functional group

Abstract

ABSTRACT:The methacrylate monomer 4-methyacryloyloxyphenyl-3Ј,4Ј-dimethoxystyryl ketone (MPDMSK), having a free-radical polymerizable group and a photocrosslinkable functional group, was synthesized. The homopolymer and copolymers of MPDMSK with glycidyl methacrylate were synthesized by free-radical solution polymerization. The structures of the newly synthesized monomers, homopolymer, and copolymers were confirmed by different spectroscopic techniques. The average molecular weights of the polymers were determined by gel permeation chromatography. The thermal stability of the polymers was measured by thermogravimetric analysis in air and the glasstransition temperatures were determined by differential scanning calorimetry under nitrogen atmosphere. The copolymer compositions were determined by 1 H-NMR analysis. The monomer reactivity ratios were determined by the application of conventional linearization methods such as Fineman-Ross, Kelen-Tü dös, and extended Kelen-Tü dös methods. The photoreactivity of both the homopolymer and the copolymers having pendant chalcone moieties was studied in various solvents. The effects of various factors such as solvents, concentrations, copolymer ratios, and photosensitizers on the rate of photocrosslinking of the newly synthesized polymers were investigated and the results were discussed for using the polymers as negative photoresists.

Aromatic polyamides containing chalconyl substituted m-phenylenediamine segments

“…The chalconyl unit has the absorption spectrum closely matched with the emission spectrum of a high--pressure mercury lamp (365 nm) that explains its high sensitivity of UV radiation. The observations are in accordance with those already published for polymers containing α,β-unsaturated carbonyl groups in the pendant chains [21][22][23][24].…”

“…Moreover, these polymers may be tailored to reach the desired requirements for specific applications [11][12][13][14][15][16][17][18]. Numerous investigations have been focused on the polymers with α, β-unsaturated carbonyl groups of acryloyl type (acrylates, cinnamates, chalcones, coumarines) in the side or main chains due to their well known photosensitivity to UV light which induce trans-cis-photoisomerization and photocrosslinking by intra-and intercatenary /2+2/ photocycloaddition reaction [19][20][21][22][23][24][25].…”

Morphology and Motional Heterogeneity in PS/PMMA Diblock Copolymers Studied by 1H and 13C Solid‐State NMR Spectroscopy

“…One of the most important applications of block copolymers at the industrial scale is their use as surfactants for the pharmaceutical, oil, agriculture, and detergent industries. [16] They also found significant practical applications as adhesives, [17] sealants, [18] crosslinking agents for elastomers, [19] surface modifiers for fillers, [20] additives for resin gelefication and hardening [21] and also as compatibilizing agents for emulsion polymerization. [22] The diblock copolymers have a morphology consisting of mobile, interface and rigid regions, which are difficult to characterize by classical techniques like X-ray, scanning electron microscopy (SEM), DSC etc.…”

Anchoring of polyelectrolyte membrane containing chalcone group to electrode substrate by [2+2] cycloaddition and its humidity-sensing properties

“…Co. and the powdery product was obtained after precipitation in acetone. 4-[(2-Methacryloyloxy)ethoxy] phenylstyryl ketone (MPSK) 25,26 and 4,4'-bis(3-triethoxysilyl)propoxy chalcone (BTSPC) 27 were prepared by a previously reported method. Methyl methacrylate, and azobisisobutyronitrile (AIBN, Aldrich Chem.…”