2005
DOI: 10.1016/j.jmmm.2004.09.015
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Studies of heteroepitaxial growth of Fe/MgO/Fe3O4 multilayer on MgO (100) substrates for fabrication of magnetic tunnel junctions

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Cited by 6 publications
(6 citation statements)
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“…5 As can be seen from the fit, the RMS roughness is relatively low, ∼ 0.2 nm, this being indispensable for the patterning of micrometric MTJs. The obtained values are smaller than those reported in MBE-deposited samples [262], but probably due to the larger roughness of the commercial MgO substrate utilized in that work and/or different growth mechanisms. In our study, we have found no clear correlation between the interface roughness and the temperature growth of the different layers.…”
Section: Fe 3 O 4 / Mgo / Fecontrasting
confidence: 72%
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“…5 As can be seen from the fit, the RMS roughness is relatively low, ∼ 0.2 nm, this being indispensable for the patterning of micrometric MTJs. The obtained values are smaller than those reported in MBE-deposited samples [262], but probably due to the larger roughness of the commercial MgO substrate utilized in that work and/or different growth mechanisms. In our study, we have found no clear correlation between the interface roughness and the temperature growth of the different layers.…”
Section: Fe 3 O 4 / Mgo / Fecontrasting
confidence: 72%
“…In addition, interest in spintronic structures based on magnetic oxides has increased recently [259], and MgO is a serious candidate as tunnel barrier because of the small lattice mismatch with the Fe 3 O 4 (0.3%) electrode [260][261][262]. Nevertheless, the performance of Fe 3 O 4 -based MTJs has been limited with scattered values and a maximum of 14% MR at room temperature [263][264][265], and other than MgO tunnel barriers were not significantly better [266][267][268][269][270].…”
Section: Fe 3 O 4 -Based Heteroepitaxial Structuresmentioning
confidence: 99%
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“…The MgO substrates were annealed in situ in an oxygen and oxygen plasma environment prior to deposition. 6 A 25-nm MgO cap layer was deposited on top of the Fe film to prevent oxidation. The substrate temperature during Fe deposition was 200°C and the deposition rate was 0.1 Å / s. In situ reflection high-energy electron diffraction ͑RHEED͒ was employed to monitor the growth of the films.…”
Section: Methodsmentioning
confidence: 99%
“…Mg interdiffusion [17][18][19] and the formation of an MgO rich interface layer have been reported [20][21][22] . MgO segregation across the MgO/Fe 3 O 4 interface is crucial since the influence of grain boundaries, interface roughness and in particular anti phase boundaries, which might partly stem from Mg segregation into the Fe 3 O 4 layer, on the lowfield magneto resistance response is at least partly controversial [23][24][25][26][27][28] . In particular, Kalev et al find the Fe ions at the Fe 3 O 4 /MgO interface to be in the Fe 3+ valence state 30 , leading to a significant reduction of spin fluctuations and magnetic neighbors at the interface.…”
Section: Introductionmentioning
confidence: 99%