“…The plasma excitation is typically established by RF power coupling mechanisms, including inductive coupling with external copper coils, capacitive coupling with external half‐shell copper electrodes, inner center electrode, hexagonal barrel, or two adjustable outer copper electrodes . Other systems combined RF coupling with MW, pure MW coupling by means of a surface guide in a quartz tube, LF 40 KHz coupling, or LF combined with MW as implemented in the commercial “Nano” type plasma equipment of Diener Electronics GmbH…”