2001
DOI: 10.1006/jssc.2000.9059
|View full text |Cite
|
Sign up to set email alerts
|

Structures and Textures of Transparent Conducting Pulsed Laser Deposited In2O3–ZnO Thin Films Revealed by Transmission Electron Microscopy

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

2
23
0

Year Published

2003
2003
2016
2016

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 42 publications
(25 citation statements)
references
References 23 publications
(6 reference statements)
2
23
0
Order By: Relevance
“…[24] Although the diffraction patterns of these Zn-rich films cannot be indexed to the series of homologous Zn k In 2 O kþ3 compounds, the variation in the measured lattice spacing with increase in In content does agree well with to that reported for the Zn k In 2 O kþ3 series which is shown for k ¼ 1 to 29 in Figure 2b using a dotted line. [25] For the In-rich films, the measured lattice constant for the as-deposited crystalline IZO films is larger than that for unstrained In 2 O 3 .…”
Section: Resultsmentioning
confidence: 99%
“…[24] Although the diffraction patterns of these Zn-rich films cannot be indexed to the series of homologous Zn k In 2 O kþ3 compounds, the variation in the measured lattice spacing with increase in In content does agree well with to that reported for the Zn k In 2 O kþ3 series which is shown for k ¼ 1 to 29 in Figure 2b using a dotted line. [25] For the In-rich films, the measured lattice constant for the as-deposited crystalline IZO films is larger than that for unstrained In 2 O 3 .…”
Section: Resultsmentioning
confidence: 99%
“…[7] These values for layer separation also agree reasonably with those extrapolated and proposed for the Zn k In 2 O k þ 3 homologous compounds for k ¼ 1 to k ¼ 29, which are shown as a dashed line in Figure 3. [8] However, we believe it is unlikely that a true series of these compounds formed in our films because of the low deposition temperature of 100 8C, which would inhibit the migration of indium ions necessary to form widely separated InO 2 À layers. Figure 4 illustrates the change in mobility, carrier concentration, and conductivity as a function of indium content for the 1 cm 2 samples cut from equivalent compositional libraries.…”
Section: Resultsmentioning
confidence: 99%
“…The dashed line shows the caxis interatomic layer spacing of the Zn k In 2 O k þ 3 homologous compounds [8]. …”
mentioning
confidence: 99%
“…But for intermediaries concentrations (0.20 \ x \ 0.70), where the films present a fibber texture (Fig. 7b), with a layered Zn k In 2 O k?3 -type structure as was shown by Dupont et al (2001), which facilitates electron mobility (Moriga et al (1999), conductivity arises and reaches maximum at the homologous phase Zn 2 In 2 O 5 . We can note that the best conductivity and mobility are reached for the sample with x = 0.50.…”
Section: Electrical Propertiesmentioning
confidence: 89%