1979
DOI: 10.1007/bf02655626
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Structures and physical properties of sputtered amorphous SiC films

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Cited by 17 publications
(11 citation statements)
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“…In Fig. 3 we compare our data with data from the literature selected as mentioned above; data include Fagen [14], Matsunami et al [15], Dutta et al [16], Heckens and Woollam [17], Sundaram et al [18], and Guerra et al [19]; most data include only k. There is a large dispersion of k data. Only the Heckens k data match the present one; the match of the Heckens data in n is not as good as in k, but the differences are not very large.…”
Section: Resultsmentioning
confidence: 99%
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“…In Fig. 3 we compare our data with data from the literature selected as mentioned above; data include Fagen [14], Matsunami et al [15], Dutta et al [16], Heckens and Woollam [17], Sundaram et al [18], and Guerra et al [19]; most data include only k. There is a large dispersion of k data. Only the Heckens k data match the present one; the match of the Heckens data in n is not as good as in k, but the differences are not very large.…”
Section: Resultsmentioning
confidence: 99%
“…As an amorphous semiconductor, SiC film optical-constant data could be fitted in principle with a Tauc-Lorentz model [26]. However, that model assumes no absorption in the range below the bandgap of the material, which for SiC is expected to be in the ∼1:6 to 2:0 eV range [14,15,18] (Ref. [15] was obtained for samples deposited at 373 K).…”
Section: Resultsmentioning
confidence: 99%
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“…Fagen [134] publicó medidas de reflectancia y el coeficiente de absorción en el intervalo 0.08-4 eV (309.7-15487.5 nm). Matsunami et al [135] publicaron medidas de reflectancia y el coeficiente de absorción en el intervalo 1.2-3.2 eV (387.2-1032.5 nm); estos autores depositaron las láminas sobre substratos a 100°C. Dutta et al [136] obtuvieron la absorción de los compuestos Si x C x F y , dependiendo de la concentración de F, incluyendo el SiC, en el intervalo 1.6-2.4 eV (516.2-774.4 nm).…”
Section: Sicunclassified
“…En el caso del SiC, este trabajo ha sido el primero en proporcionar un conjunto de n y k en el intervalo 190-300 nm. En la figura 4.12 se muestran las constantes ópticas obtenidas en este trabajo junto con los datos de Fagen [134], Matsunami et al [135], Dutta et al [136], Heckens y Woollam [137], Sundaram et al [138] y Guerra et al [139]. Todos ellos usaron la técnica de deposición por sputtering.…”
Section: Obtención De Constantes óPticasunclassified