2012 International Semiconductor Conference Dresden-Grenoble (ISCDG) 2012
DOI: 10.1109/iscdg.2012.6359994
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Structured epitaxial graphene on SiC

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Cited by 4 publications
(6 citation statements)
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“…Note that the plateau is almost exactly 1 G0 , precisely as observed in ≈ 1µm wide ribbons on nonpolar epigraphene [11], in ≈ 40 nm wide epigraphene ribbons on the sidewalls of steps etched in SiC, [10] and, originally in meandering ≈ 40 nm wide epigraphene ribbons that decorate natural steps on SiC [61]. We again see it here on 435 µm long ribbons that are decoupled from the SiC substrate.…”
Section: Top-gated Seg and Qfsgsupporting
confidence: 60%
“…Note that the plateau is almost exactly 1 G0 , precisely as observed in ≈ 1µm wide ribbons on nonpolar epigraphene [11], in ≈ 40 nm wide epigraphene ribbons on the sidewalls of steps etched in SiC, [10] and, originally in meandering ≈ 40 nm wide epigraphene ribbons that decorate natural steps on SiC [61]. We again see it here on 435 µm long ribbons that are decoupled from the SiC substrate.…”
Section: Top-gated Seg and Qfsgsupporting
confidence: 60%
“…On the C-face, N is determined by both T (1450 °C-1525 °C) and time (1 min to several hours for very thick films) [597,615] [606] (see section IV.1.3 and figures IV.5(a)-(c)). Templated graphene growth of nanostructures (e.g.SiC sidewalls [618][619][620]) on non-polar facets (i.e. other that (0 0 0 1) and 0 0 0 1 ) is finely tuned close to the buffer layer growth conditions.…”
Section: Iv12 Near Equilibrium Confinement Controlled Growthmentioning
confidence: 99%
“…Masking methods, for selective growth using AlN [727], SiN [728] and amorphous C masks [642] with tens of nm precision have been proposed. The template growth method on sidewalls of SiC trenches [604,615,618,619] is described below. It circumvents the detrimental effect of traditional plasma etching [729,730] and resulting sidewall nanoribbons show RT ballistic transport properties [620].…”
Section: Iv110 Structured Growthmentioning
confidence: 99%
“…In a transport measurement, an external voltage V creates a difference of chemical potential between two contacts u − −u + = eV and generates a net current [25,26] k k…”
Section: Science China Materialsmentioning
confidence: 99%
“…the net current can be written as I = 2×e/h(u − −u + ) [ 25,26]. The factor 2 in Equation (3) comes from the spin degree of freedom.…”
Section: Science China Materialsmentioning
confidence: 99%