Structure zone model for extreme shadowing conditions

Mukherjee, Sudip; Gall, Daniel

doi:10.1016/j.tsf.2012.11.007

Cited by 97 publications

(49 citation statements)

References 58 publications

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“…While e-beam evaporation has been used for the deposition of a large variety of materials, including amorphous and crystalline semiconductors [80,86,106,139,140], metals [29,[141][142][143][144][145][146], oxides [48,79,89,[147][148][149] and even molecular materials [71,103,150], MS has been the most widely used method for the deposition of metals and oxides when control over the crystalline structure and/or surface roughness is an issue.…”

Section: Magnetron Sputteringmentioning

confidence: 99%

“…The terms 'simulations' and 'experiments', which were intentionally included in the title of this section, underline the importance of a combined approach when dealing with complex atomistic phenomena such as those involved in the OAD of thin films. From a fundamental perspective, a key model in this section is the SZM that was already mentioned in Sections 2 and 3 [35][36][37]142]. Despite its phenomenological basis, it provides valuable information on the competition between surface shadowing mechanisms and thermally activated diffusion, which is useful for introducing simplified assumptions in growth models under various conditions [265].…”

Section: New Concepts For Process-control In Oblique Angle Depositionmentioning

confidence: 99%

See 1 more Smart Citation

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

583

431

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a b s t r a c tThe oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting from its incorporation in actual devices. In contrast with other reviews on the subject, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques. To account for the existing differences between deposition in vacuum or in the presence of a plasma, mechanistic simulations are critically revised, discussing well-established paradigms such as the tangent or cosine rules, and proposing new models that explain the growth of tilted porous nanostructures. In the second part, we present an extensive description of applications wherein oblique-angle-deposited thin films are of relevance. From there, we proceed by considering the requirements of a large number of functional devices in which these films are currently being utilized (e.g., solar cells, Li batteries, electrochromic glasses, biomaterials, sensors, etc.), and subsequently describe how and why these nanostructured materials meet with these needs.

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Section: Magnetron Sputteringmentioning

confidence: 99%

Section: New Concepts For Process-control In Oblique Angle Depositionmentioning

confidence: 99%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

583

431

View full text Add to dashboard Cite

show abstract

“…Large categories of materials can be prepared by electron beam evaporation technique [11] such as amorphous and crystalline semiconductors [12], metals [13], oxides [14], and molecular materials [15].…”

Section: Electron Beam Evaporationmentioning

confidence: 99%

Advance Deposition Techniques for Thin Film and Coating

Jilani¹,

Abdel-wahab²,

HosnyHammad³

2017

Modern Technologies for Creating the Thin-Film Systems and Coatings

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Thin films have a great impact on the modern era of technology. Thin films are considered as backbone for advanced applications in the various fields such as optical devices, environmental applications, telecommunications devices, energy storage devices, and so on . The crucial issue for all applications of thin films depends on their morphology and the stability. The morphology of the thin films strongly hinges on deposition techniques. Thin films can be deposited by the physical and chemical routes. In this chapter, we discuss some advance techniques and principles of thin-film depositions. The vacuum thermal evaporation technique, electron beam evaporation, pulsed-layer deposition, direct current/radio frequency magnetron sputtering, and chemical route deposition systems will be discussed in detail.

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“…Magnetron sputtering deposition process is a physical vapor deposition and it possesses extreme fl exibility for different material deposition. [ 51 ] The above-mentioned regular network-structured arrays (shown in Figure S6, Supporting Information) were applied as the secondary templates for further sputtering deposition. At the beginning of sputtering deposition process, high pure argon is imported into the vacuum chamber at a steady slow speed.…”

Section: Formation Of Periodic Spherical Nanoparticle Arraysmentioning

confidence: 99%

Spherical Nanoparticle Arrays with Tunable Nanogaps and Their Hydrophobicity Enhanced Rapid SERS Detection by Localized Concentration of Droplet Evaporation

Zhang

Zhou

Liu

et al. 2015

Adv Materials Inter

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Their properties are usually dependent on morphologies and sizes, and hence the fabrication of controllable uniform micro/nanostructured arrays on a large-scale becomes more important. Conventional methods for obtaining periodical nanostructured arrays are lithographic techniques including laser lithography, [ 26,27 ] electron-beam lithography, [28][29][30] X-ray lithography, [ 31 ] atomic force microscope lithography, [ 32 ] scanning tunneling microscopy technology, [ 33 ] and so on. However, these techniques can not be afforded to most laboratories because of their high processing costs and lower production effi ciency. [ 34 ] In recent decades, with fast development of colloidal science and self-assembly technology, large-scaled monolayer colloidal crystals can be fabricated using highly monodispersed colloidal spheres. [ 35 ] Based on this achievement, another alternative method, colloidal lithography, has been well developed to fabricate multiform periodic micro/nanostructured arrays (i.e., nanoparticle arrays, nanobowl arrays, nanoring arrays, and nanopillar arrays) using these monolayer colloidal crystals as templates or masks [36][37][38][39] by chemical routes including solution-dipping strategy, wet chemical etching, and electrochemical deposition. [40][41][42][43] Such periodic micro/nanostructured array fi lms generally have special rough surfaces, which can be used as SERS-active substrates for detection and identification of organic molecules with trace concentrations. Although chemical routes based on colloidal templates possess advantages of the simple operation, low processing costs, it is still quite diffi cult to achieve micro/nanostructured arrays with very uniform morphology on large-scale by above routes. If these micro/ nanostructured arrays are applied as active substrates in SERS detection, the intensity of SERS spectra in different areas on the sample will fl uctuate in a large range, leading to the failure in practical applications. Whereas other parallel routes, based on physical process method, such as sputtering deposition, pulsed laser deposition, thermal evaporation deposition, atomic layer deposition, and so on, combining with monolayer colloidal crystals template can well resolve these problems. [ 44 ] SERS enhancement activities are mainly dependent on chemical enhancement or local electromagnetic fi eld enhancement at nanoscaled protrusions and cavities. For the latter case, the Periodic hexagonal spherical nanoparticle arrays are fabricated by a sacrificial colloidal monolayer template route by chemical deposition and further physical deposition. The regular network-structured arrays are fi rst templated by colloidal monolayers and then they are changed to novel periodic spherical nanoparticle arrays by further sputtering deposition due to multiple direction deposition and shadow effect between adjacent nanoparticles. The nanogaps between two adjacent spherical nanoparticles can be well tuned by controlling deposition time. Such periodic nanoparticle arrays with gold coatings ...

show abstract

Structure zone model for extreme shadowing conditions

Cited by 97 publications

References 58 publications

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Advance Deposition Techniques for Thin Film and Coating

Spherical Nanoparticle Arrays with Tunable Nanogaps and Their Hydrophobicity Enhanced Rapid SERS Detection by Localized Concentration of Droplet Evaporation

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