2014
DOI: 10.1039/c3tc32538e
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Structure–property relationships in multifunctional thieno(bis)imide-based semiconductors with different sized and shaped N-alkyl ends

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Cited by 31 publications
(35 citation statements)
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“…2a) and summarized in Table 1, thin films of C 4 -NT4N deposited at 0.1 Å s À1 by thermal sublimation exhibit ambipolar field-effect transport with saturated electron and hole mobilities up to 4.5 Â 10 À2 cm 2 V À1 s À1 and 6.7 Â 10 À4 cm 2 V À1 s À1 , respectively. In agreement with a previous report on C 4 PMMA films, 16 XRD analysis reveals that thermal sublimation of C 4 -NT4N on HMDS-functionalized silicon dioxide yielded the phase B ( Fig. S1, ESI †).…”
Section: Vacuum Depositionsupporting
confidence: 92%
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“…2a) and summarized in Table 1, thin films of C 4 -NT4N deposited at 0.1 Å s À1 by thermal sublimation exhibit ambipolar field-effect transport with saturated electron and hole mobilities up to 4.5 Â 10 À2 cm 2 V À1 s À1 and 6.7 Â 10 À4 cm 2 V À1 s À1 , respectively. In agreement with a previous report on C 4 PMMA films, 16 XRD analysis reveals that thermal sublimation of C 4 -NT4N on HMDS-functionalized silicon dioxide yielded the phase B ( Fig. S1, ESI †).…”
Section: Vacuum Depositionsupporting
confidence: 92%
“…Moreover, considering that the bottom contact configuration is usually characterized by less effective charge injection than that of the top contact one, 19 also the hole and electron carrier mobilities are in good agreement with what was previously reported. 16 On the other hand, the threshold for electron transport is higher when HMDS-treated SiO 2 was used instead of PMMA (i.e. a material with a low surface trapping density) as a dielectric layer, confirming that the electron traps cannot be completely passivated through the functionalization with HMDS.…”
Section: -Nt4n Deposited Onmentioning
confidence: 92%
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