2016
DOI: 10.1103/physrevb.94.184416
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Structure of MnSi on SiC(0001)

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Cited by 5 publications
(1 citation statement)
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“…Although the lattice constants of our MnxFe1-xGe films are larger than the corresponding lattice spacing of the silicon substrate (5.4313/2=4.703 Å) for x > 0.17 our films consistently have lateral expansion and perpendicular compression, regardless of x. This suggests that the strain deformation in the cubic B20 crystalline thin films is most likely due to the mismatch in the thermal expansion coefficient between the film and Si, rather than the direct room temperature lattice mismatch [23]. Nevertheless, we find that by growing MnxFe1-xGe thin films using MBE, we are able to reduce the strain by a factor of four as compared to the strain in sputtered B20 FeGe thin films [16].…”
Section: Growth and Physical Characterizationmentioning
confidence: 68%
“…Although the lattice constants of our MnxFe1-xGe films are larger than the corresponding lattice spacing of the silicon substrate (5.4313/2=4.703 Å) for x > 0.17 our films consistently have lateral expansion and perpendicular compression, regardless of x. This suggests that the strain deformation in the cubic B20 crystalline thin films is most likely due to the mismatch in the thermal expansion coefficient between the film and Si, rather than the direct room temperature lattice mismatch [23]. Nevertheless, we find that by growing MnxFe1-xGe thin films using MBE, we are able to reduce the strain by a factor of four as compared to the strain in sputtered B20 FeGe thin films [16].…”
Section: Growth and Physical Characterizationmentioning
confidence: 68%