2015
DOI: 10.1016/j.apsusc.2014.11.130
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Structure, mechanical and tribological properties of HfCx films deposited by reactive magnetron sputtering

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Cited by 32 publications
(13 citation statements)
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“…The patterns for the TaC and HfC binary films show the peaks associated to the cubic Fm3-m TaC and HfC phases, JCPDS-ICDD 00-035-0801 and JCPDS-ICDD 03-065-7113, respectively. The occurrence of the cubic TaC and HfC phases in the binary films with a good crystallinity and without secondary phases contrast to previously reported studies where Ta 2 C and TaC 28 and metallic Hf and HfC 22 mixed phases were obtained. In the case of the ternary alloys, the 70TaC-30HfC sample retains the structure of the TaC, only showing a change in the intensity of the diffracted peaks.…”
Section: Resultscontrasting
confidence: 99%
See 1 more Smart Citation
“…The patterns for the TaC and HfC binary films show the peaks associated to the cubic Fm3-m TaC and HfC phases, JCPDS-ICDD 00-035-0801 and JCPDS-ICDD 03-065-7113, respectively. The occurrence of the cubic TaC and HfC phases in the binary films with a good crystallinity and without secondary phases contrast to previously reported studies where Ta 2 C and TaC 28 and metallic Hf and HfC 22 mixed phases were obtained. In the case of the ternary alloys, the 70TaC-30HfC sample retains the structure of the TaC, only showing a change in the intensity of the diffracted peaks.…”
Section: Resultscontrasting
confidence: 99%
“…The fitting of the C 1s spectra in Fig. 3a showed the presence of Ta-C bonds in the TaC binary film at a binding energy around 283.0 eV 21 , Hf-C bonds in the HfC sample at around 282.2 eV 22 , and the presence of both Ta-C and Hf-C bonds in the ternary alloy films. A minor amount of C-C bonds at around 285.0 eV 23 was also detected.…”
Section: Resultsmentioning
confidence: 94%
“…Figure 2 shows the XPS Ta 4f and Hf 4f spectra of the TaC, HfC, and Ta-Hf-C mixture samples. The main Ta 4f 7/2 and Hf 4f 7/2 peak positions are located at approximately 23.3 and 14.8 eV and can be attributed to TaC [34] and HfC [33] carbide bonds, confirming the presence of carbides in their pure form. From the area of the photoelectron peaks, it was also possible to estimate the TaC and HfC phase contents in the mixture samples, and these values, which are listed in Table 1, demonstrate that the TaC and HfC contents are almost correlated to the RF power applied to the Ta and Hf targets.…”
Section: X-ray Photoelectron Spectroscopy (Xps)mentioning
confidence: 75%
“…The thicknesses of the Ta-Hf-C coatings were determined from the cross-sectional SEM images and are listed in Table 1. The TaC films are slightly thicker due to the higher sputtering yield of tantalum compared with that of hafnium [33].…”
Section: Cross-sectional Scanning Electron Microscopy (Sem)mentioning
confidence: 99%
“…HfC coatings can be synthesized in a reactive mode with C 2 H 2 or CH 4 [24,25]. The same effect was observed in TaC coatings; that is, the hardness decreases due to the appearance of an amorphous phase.…”
Section: Introductionmentioning
confidence: 76%