Structure formation in UV-laser ablated poly-ethylene-terephthalate (PET)

Arenholz, E.; Švorčı́k, Václav; Kefer, T.; Heitz, J.; Bäuerle, D.

doi:10.1007/bf00357196

Cited by 49 publications

(14 citation statements)

References 6 publications

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“…The laser ablation threshold is conventionally regarded as the laser fluence below which the ablation rate is zero. It is not therefore surprising that relatively limited attention has been paid to the etching behaviors below the ablation threshold, although some physical changes have been observed on the irradiated surfaces [18], [19]. Fractional monolayer etching rates below the ablation threshold are confirmed in Fig.…”

Section: Resultssupporting

confidence: 61%

“…For laser fluences below the ablation threshold, the etch rate is conventionally regarded as fractional of monolayer. A limited number of studies have been conducted in this range [18], [19]. This work provides a detailed investigation on the etch rate behaviors below the ablation threshold, thereby allowing better understanding of the statistical meaning of the etch rate per laser pulse.…”

Section: Introductionmentioning

confidence: 99%

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Excimer laser projection micromachining of polyimide thin films annealed at different temperatures

Zhang

Grigoropoulos²,

Krajnovich³

et al. 1996

IEEE Trans. Comp., Packag., Manufact. Technol. C

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Abstract-A KrF excimer laser projection micromachining tool has been designed and implemented aiming to accomplish onestep etching with micron resolution for applications such as chip module packaging and polyimide technology in semiconductor manufacturing. Two polyimide (Probimide 7020) thin films spun on the silicon wafers are annealed at 100 C and 400 C, respectively, in order to investigate the effect of the annealing temperature on the laser micromachining process. The micromachined polyimide surface morphology is studied by scanning electron microscopy (SEM), atomic force microscopy (AFM), and a surface profilometer for determination of the etch rate at different laser fluences. Micromachining with micron resolution is achieved by this excimer laser projection tool. Measured on a 25 m line, the etch rate dependence on laser fluence both below and above the ablation threshold is investigated over the fluence range from 10-1000 mJ/cm 2 : The polyimide thin film optical properties, i.e., the components of the complex refractive index, n and k at = 248 nm are measured by a spectroscopic ellipsometer for both films. The etch rate above the ablation threshold for the film annealed at 100 C is found 60% higher than that for the film annealed at 400 C. This behavior originates from the correspondingly higher by 82% absorption coefficient, in the 100 C film. The ablation thresholds for both films are found the same at about 100 mJ/cm 2 : Calculated etch rates agree with experimental values within 15%. Etch rates of the order of nanometer can be achieved near the ablation threshold of 100 mJ/cm 2 for both films. The linearity between the etched depth and the number of the laser pulses prevails for the micromachining process at and above the threshold.

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Section: Resultssupporting

confidence: 61%

Section: Introductionmentioning

confidence: 99%

Excimer laser projection micromachining of polyimide thin films annealed at different temperatures

Zhang

Grigoropoulos²,

Krajnovich³

et al. 1996

IEEE Trans. Comp., Packag., Manufact. Technol. C

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“…Results from both techniques demonstrate that the wall type nano and microstructures appeared on EUV treated surfaces which become more pronounced with an increase in the number of EUV shots. The micropattern introduced by EUV modication are similar to those which appeared after ultraviolet irradiation [15].…”

Section: Resultssupporting

confidence: 58%

Polycarbonate Polymer Surface Modification by Extreme Ultraviolet (EUV) Radiation

et al. 2014

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The degree of the biocompatibility of polycarbonate (PC) polymer used as biomaterial can be controlled by surface modication for various biomedical engineering applications. In the past, PC samples were treated by excimer laser for surface reorganization however associated process alteration of bulk properties is reported. Extreme ultraviolet radiation can be employed in order to avoid bulk material alteration due to its limited penetration. In this study, a 10 Hz laser-plasma EUV source based on a double-stream gas-pu target irradiated with a 3 ns and 0.8 J Nd:YAG laser pulse was used to irradiate PC samples. The PC samples were irradiated with dierent number of EUV shots. Pristine and EUV treated samples were investigated by scanning electron microscopy and atomic force microscopy for detailed morphological characterization of micropatterns introduced by the EUV irradiation. Associated chemical modications were investigated by X-ray photoelectron spectroscopy. Pronounced wall-type micro-and nanostructures appeared on the EUV modied surface resulting in a change of surface roughness and wettability.

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“…This structure is rather not oriented, however, further irradiation results in larger quasi--periodic well oriented structure. The nanostructure is thus an initial stage of a wall-like microstructure formation well described in [7,15].…”

Section: Surface Morphologymentioning

confidence: 94%

“…These are usually conical * corresponding author; e-mail: abartnik@wat.edu.pl [4,5] wall-or nap-type [6,7] structures. Irradiation of polystyrene (PS) with KrF laser close to the ablation threshold resulted in formation of surface ripple structures with sub-µm periodicity [8,9].…”

Section: Introductionmentioning

confidence: 99%

EUV-Induced Nanostructuring of Solids

et al. 2012

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In this work results of investigations concerning nanostructuring of polymers and some other solids using a laser-plasma extreme ultraviolet source are presented. The plasma radiation was produced using a gas puff target and focused with a gold-plated grazing incidence ellipsoidal collector. Decomposition process of polymers was investigated using a quadrupole mass spectrometer. Different kinds of micro-and nanostructures created in near-surface layers of the materials were investigated using scanning electron microscope. Forms of the structures depend on a particular material and the extreme ultraviolet exposure. In case of some polymers even a single shot is sufficient for creation of the visible changes in surface morphology. In case of inorganic solids visible changes require usually the exposure with tens or hundreds of extreme ultraviolet pulses.

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Structure formation in UV-laser ablated poly-ethylene-terephthalate (PET)

Cited by 49 publications

References 6 publications

Excimer laser projection micromachining of polyimide thin films annealed at different temperatures

Excimer laser projection micromachining of polyimide thin films annealed at different temperatures

Polycarbonate Polymer Surface Modification by Extreme Ultraviolet (EUV) Radiation

EUV-Induced Nanostructuring of Solids

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