Structure characterization of vanadium oxide thin films prepared by magnetron sputtering methods

Physical and electrochemical properties of vanadium alloy oxide layers prepared by anodic passivation

“…6 shows the XPS plot. Taking into account the results of the work [2,6] we cannot conclude which kind of vanadium oxide exist in reality. Using the results shown in Fig.…”

“…There are different methods to produce such layers. One example is the deposition of vanadium oxides on substrates by reactive sputtering, as described by Cui [2].…”

Electrical Conducting Behavior of W- Doped VO2 Thin Films / La0.5Sr0.5CoO3Heterostructure

“…In the last decades, many techniques for thin film growth including sputtering [12], [13], evaporation [14], [15], pulsed laser deposition [16], and sol-gel process [17], [18], etc. have been adopted to deposit VO 2 films on various substrates.…”

Low temperature fabrication of vanadium oxide films for uncooled bolometric detectors

“…Hence, to make the bolometer layer compatible with the CMOS ROIC, the deposition temperature of VO x material should be kept under 400°C [2]. 1350 A wide range of deposition methods has been utilized to deposit VO x thin films, including sputtering [3], evaporation [4], chemical vapor deposition [5,6], pulsed laser deposition [2], as well as sol-gel methods [7]. Reactive ion beam sputtering permits greater control over deposition parameters and provides an important fabrication approach for optimization of vanadium oxide thin film materials to meet various applications.…”