Vacuum
 1991
DOI: 10.1016/0042-207x(91)90130-b
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Structure and properties of TiSi2 films on Si, obtained by Ti and Si co-evaporation in high vacuum

K. A. Valiev
1
,
Alexander Vasiliev
2
,
A.A. Orlikovskij
3
et al.
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Cited by 5 publications
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Titanium disilicide on silicon by interdiffusion of titanium and amorphous silicon multilayers: transmission electron microscopy, spectroscopic ellipsometry and resistivity measurements

Nassiopoulos
1
,
Tambouris
2
,
Frangis3
et al. 1994
Thin Solid Films
5
0
1
0
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Titanium disilicide on silicon by interdiffusion of titanium and amorphous silicon multilayers: transmission electron microscopy, spectroscopic ellipsometry and resistivity measurements

Nassiopoulos
1
,
Tambouris
2
,
Frangis3
et al. 1994
Thin Solid Films
5
0
1
0
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Investigation of thermal stability of multilayered Si/TiSi2Al and Si/TiSi2(TiN)WAl systems

Киселев
1
,
Lebedev
2
,
Orlikovsky
3
et al. 1993
Vacuum
2
0
0
0
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Electron microscopy of structurally different titanium disilicide films, obtained in one technological process

Киселев
1
,
Lebedev
2
,
Vasiliev
3
et al. 1993
Vacuum
0
0
0
0
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