2001
DOI: 10.1016/s0038-1098(01)00411-2
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Structure and optical properties of carbon nitride films deposited by magnetron sputtering

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Cited by 38 publications
(28 citation statements)
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“…This trend indicates that substantial amounts of nitrogen atoms are also etched by the incoming species. The liberated nitrogen atoms recombine to form N 2 molecules, which can either diffuse to the surface or stay inside the film inducing the formation of voids (low density) [7,13,14]. The ERDA and NRA measurements confirm these arguments and reveal a systematic presence of a significant amount of hydrogen and oxygen.…”
Section: Resultsmentioning
confidence: 60%
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“…This trend indicates that substantial amounts of nitrogen atoms are also etched by the incoming species. The liberated nitrogen atoms recombine to form N 2 molecules, which can either diffuse to the surface or stay inside the film inducing the formation of voids (low density) [7,13,14]. The ERDA and NRA measurements confirm these arguments and reveal a systematic presence of a significant amount of hydrogen and oxygen.…”
Section: Resultsmentioning
confidence: 60%
“…Indeed, in amorphous carbon nitride, the sp 2 bonds can obviously be either CC or CN. The decrease observed for E Tauc optical gap with the increasing rf power, appears to be related to the local bonding changes due to the desorption of nitrogen from the growing films (a decrease of the CN proportion), increasing the concentration of Csp 2 sites (graphitization) and therefore, the CC network connectivity [14].…”
Section: Resultsmentioning
confidence: 89%
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