Structure and morphology of thin SnO2 films

SnO2 thin films for gas sensors modified by hexamethyldisilazane after rapid thermal annealing

“…After that, a tin dioxide layer with thickness of about 40 nm is deposited by rf sputtering from a SnO 2 standard target (Leibold Heraus). The layer is polycrystalline with a well-defined columnar grain structure [11]. As a modifier, hexamethyldisilazane (HMDS) is used, dropped from solution and dried at room temperature.…”

Structural, optical and electrical properties of tin oxide thin film deposited by APCVD method

“…The transparency and conductivity of these oxides are assumed to be caused by deviations from stoichiometry, doping and by the microstructure of the films [3]. A number of techniques are employed in the formation of high quality SnO 2 thin films such as CVD [4][5][6], electron beam evaporation [7], spray pyrolysis [7][8][9], spin-coating method [10], filtered *Corresponding Author : arc vacuum deposition [11,12], etc. The properties of the deposited films are strongly dependent on the deposition techniques employed.…”

Mechanism of Surface Morphology Development of Tin Oxide Transparent Conductive Films

“…It is known that SnO 2 films deposited by chemical vapor deposition (CVD) can develop a textured surface morphology, which has essentially different features from films deposited by physical vapor deposition (PVD) methods such as sputtering deposition. 6) Large faceted crystallites grow on hydrolysis films at high temperatures, i.e., over 800 K. 7) This type of surface morphology is beneficial for applying the TCO-coated glass as the substrates for thin film silicon solar cells, since light diffraction at the interface between the TCO and Si is one the of required characteristics of the substrate as well as a low optical absorption and low sheet resistance. 8) It is understood that the diffraction behaves like an antireflection effect.…”