Structure and conducting properties of La1-xSrxCoO3-δ films

Electrical Conductivity and Oxygen Exchange Kinetics of La[sub 2]NiO[sub 4+δ] Thin Films Grown by Chemical Vapor Deposition

“…7 we plot the k Ex values, extracted from the fast process with time constant 1 , as a function of temperature for both oxidation and reduction processes for the two film thicknesses. The four graphs correspond to the four different final oxygen pressures reached in the reaction chamber after gas switching.…”

“…The preparation of thin films of materials with both high ionic and electronic conductivity is a major objective to achieve optimum performance in different electrochemical devices, such as solid oxide fuel cells, 1 gas sensors, oxygen membrane generators, catalytic oxidation systems, etc. Particularly, mixed ionic-electronic conductor ͑MIEC͒ oxides with high oxygen reduction kinetics are needed in order to reduce solid oxide fuel cell ͑SOFC͒ operating temperatures.…”

Structure and impedance spectroscopy of La0.6Ca0.4Fe0.8Ni0.2O3−δ thin films grown by pulsed laser deposition

“…Y-doped zirconia (YSZ), in single crystal and polycrystalline form, was used as substrate. The substrates were mounted on a heater and the films were deposited at a substrate temperature of 700 • C, taking into account the existing literature [7][8][9][10] and our previous experience in PLD in similar samples [16]. The temperature of the substrate is one of the main parameter affecting atomic surface mobility during the deposition process.…”

“…On the other hand, pulsed laser deposition (PLD) has been recently used to fabricate La-Sr-Co-O thin films for application to SOFC [7][8][9][10][11][12][13][14], as using integrated oxide thin films for fuel cell design can reduce the size and cost of cells. Due to its high chemical reactivity with yttria-stabilized zirconia at high temperature [15], doped lanthanum cobaltite cannot be used as a cathode in high temperature SOFCs.…”

Electrochemical characterization of YSZ thick films deposited by dip-coating process

“…Such geometry cannot be used for thick films because of the small thickness of the electrolytic material and of an asymmetric geometry: this feature led us to find an alternative methodology [15][16][17][18].…”